has been investigated for use as a high resolution photoresist material since the early 1970s,Zenkin, S. A.; Mamedov, S. B.; Mikhailov, M. D.; Turkina, E. Yu.; Yusupov, I. Yu. Glass Phys. Chem. 1997, 5, pp 393-399. using aqueous etchants. Although these aqueous etchants allowed for low-aspect ratio 2-D structures to be fabricated, they do not allow for the etching of high aspect ratio structures with 3-D periodicity. Certain organic reagents, used in organic solvents, permit the high-etch selectivity required to produce high-aspect ratio structures with 3-D periodicity.
