  We propose a method for computing a sewing pattern of a given 3D garment
model. Our algorithm segments an input 3D garment shape into patches and
computes their 2D parameterization, resulting in pattern pieces that can be cut
out of fabric and sewn together to manufacture the garment. Unlike the general
state-of-the-art approaches for surface cutting and flattening, our method
explicitly targets garment fabrication. It accounts for the unique properties
and constraints of tailoring, such as seam symmetry, the usage of darts, fabric
grain alignment, and a flattening distortion measure that models woven fabric
deformation, respecting its anisotropic behavior. We bootstrap a recent patch
layout approach developed for quadrilateral remeshing and adapt it to the
purpose of computational pattern making, ensuring that the deformation of each
pattern piece stays within prescribed bounds of cloth stress. While our
algorithm can automatically produce the sewing patterns, it is fast enough to
admit user input to creatively iterate on the pattern design. Our method can
take several target poses of the 3D garment into account and integrate them
into the sewing pattern design. We demonstrate results on both skintight and
loose garments, showcasing the versatile application possibilities of our
approach.
