  Growth optimization of multilayers is a topic of interest due to their unique
physical properties. Systems containing magnetic materials, such as
platinum-cobalt, have been studied because of their potential for technological
applications, e.g. spintronics, magnetic storage and magnetic sensors. Since
the magnetic properties of thin layers are strongly related to the growth
parameters, the fine tuning of these parameters is necessary to produce
multilayers with specific properties required in various applications. Here, an
efficient approach to tune the coercive field of Co ultrathin films in the
multilayer by varying the underlayer thickness is demonstrated. Using magnetron
sputtering, we prepared multilayer systems of Au(x)/Pt(5nm)/Co(0.7nm)/Au(5nm)
with various thicknesses of Au underlayer. The surface morphology of
Au(x)/Pt(5nm) stack on which Co layer was deposited was studied by atomic force
microscopy. We show the possibility to control the interfacial roughness by
changing the Au underlayer thickness due to its island-like growth mechanism
(Volmer-Weber mode). As the nominal thickness of Au increases, the islands grow
in larger lateral size, resulting in a higher overall roughness of the layer
surface. Magnetization measurements indicate a direct influence of the
underlayer roughness on the coercivity of the multilayers by promoting
additional magnetic anisotropy. With thickness of the Au layer up to 20 nm, we
can change the coercive field in the range from ~200 Oe to ~1100 Oe, while
remaining a nearly constant saturation magnetization. The use of Cu replacing
Au underlayer in the same multilayers was also investigated, demonstrating the
possibility of coercivity adjustment using different materials. The results are
important for applications where the magnetic properties of multilayer
structures based on Co thin films could be adjusted via buffer layer roughness
engineering.
