  We present a simple and fast method for thickness characterization of
suspended graphene flakes that is based on transmission electron microscopy
(TEM) techniques. For this method, the dynamical theory of electron diffraction
(Bloch-wave approach in two-beam case approximation) was used to obtain an
analytical expression for the intensity of the transmitted electron beam I0(t),
as function of the specimen thickness t for thin samples (t<< {\lambda}; where
{\lambda} is the absorption constant for graphite). We show that in thin
graphite crystals the transmitted intensity is a linear function of the
thickness. To obtain a more quantitative description of I0(t), high resolution
(HR) TEM simulations are performed using the Bloch wave approach of the JEMS
software. From such calculations, we obtain {\lambda} for a 001 zone axis
orientation, in a two-beam case and in a low symmetry orientation.
Subsequently, HR (used to determine t) and bright-field (to measure I0(0) and
I0(t)) images were acquired to experimentally determine {\lambda}. We obtain
that the experimental value in the low symmetry orientation is close to the
calculated value (i.e. {\lambda}=225 nm for 300 kV accelerating voltage and 3
mrad collection angle). The simulations also show that the linear approximation
obtained from the analytical expression is valid up to a sample thickness of
several ten nanometers, depending on the orientation. When compared to standard
techniques for thickness determination of graphene/graphite, the method we
propose has the advantage of being relatively simple and fast, requiring only
the acquisition of bright-field images.
