  Near-field scanning optical microscopy has been an indispensable tool for
designing, characterizing and understanding the functionalities of diverse
nanoscale photonic devices. As the advances in fabrication technology have
driven the devices smaller and smaller, the demand has grown steadily for
improving its resolving power, which is determined mainly by the size of the
probe attached to the scanner. The use of a smaller probe has been a
straightforward approach to increase the resolving power, but it cannot be made
arbitrarily small in practice due to the steep reduction of the collection
efficiency. Here, we develop a method to enhance the resolving power of
near-field imaging beyond the limit set by the physical size of the probe
aperture. The main working principle is to unveil high-order near-field
eigenmodes invisible with conventional near-field microscopy. The destructive
interference of near-field waves is induced in these high-order eigenmodes by
the locally varying phases, which can reveal subaperture-scale fine structural
details. To extract these eigenmodes, we construct a self-interference
near-field microscopy system and measure a fully phase-referenced far- to
near-field transmission matrix (FNTM) composed of near-field amplitude and
phase maps recorded for various angles of far-field illumination. By the
singular value decomposition of the measured FNTM, we could extract the
antisymmetric mode, quadrupole mode, and other higher-order modes hidden under
the lowest-order symmetric mode. This enables us to resolve double and triple
nano-slots whose gap size (50 nm) is three times smaller than the diameter of
the probe aperture (150 nm). The subaperture near-field mode mapping by the
FTNM can be potentially combined with various existing near-field imaging
modalities and promote their ability to interrogate local near-field optical
waves of nanoscale devices.
