  Evanescent-wave microscopy achieves sub-diffraction axial sectioning by
confining fluorescence excitation to a thin layer close to the cell/substrate
interface. How thin this light sheet exactly is, however, is often unknown.
Particularly in the popular objective-type total internal reflection
fluorescence microscopy (TIRFM) configuration large deviations from the
expected exponential intensity decay of the evanescent wave have been reported.
Propagating, i.e., non-evanescent, excitation light diminishes the optical
sectioning effect, reduces contrast and renders the quantification of TIRFM
images uncertain. Here, we use a combination of azimuthal- and polar-angle beam
scanning, dark-field scatter imaging, and atomic force microscopy to identify
the sources of this unwanted background fluorescence excitation. We identify
stray light originating from the microscope optics and the objective lens
itself as the major sources of background, with minor contributions due to
evanescent-wave scattering at the reflecting interface and at refractive-index
boundaries in the sample. Apart from evanescence in excitation light, light
emitted from a fluorophore can also show observable effects of evanescence.
Only fluorophores located close to the coverslip can couple their near-field
radiation into propagating waves detectable at supercritical angles. We show
that selectively detecting this supercritical-angle fluorescence (SAF) through
a high-numerical aperture objective effectively rejects fluorescence from
deeper sample regions and improves optical sectioning. The microscopy scheme
presented here merges the benefits of TIRF excitation and SAF detection and
provides the conditions for quantitative wide-field imaging of fluorophore
dynamics at or near the plasma membrane.
