  We present deposition and characterization of multilayers consisting of 20
repetitions of 15 $\r{A}$ thick permalloy Ni$_{80}$Fe$_{20}$ at. \% (Py) and 5
$\r{A}$ Pt. The samples were prepared by two different sputter deposition
methods, namely dc magnetron sputtering (dcMS) and high power impulse magnetron
sputtering (HiPIMS), that represent low and moderate ionized flux fraction of
the film forming material, respectively, for deposition of the Py layers. The
effect of substrate roughness, working gas pressure and sputter power on the
in-plane uniaxial magnetic anisotropy of the films are studied. The multilayers
were characterized by X-ray reflectivity and diffraction, and by
magneto-optical Kerr effect (MOKE). It is shown that HiPIMS deposition produces
multilayers with unique surface roughness regardless of the substrate surface
roughness. Multilayers prepared by both dcMS and HiPIMS deposition present a
strong (111) texture normal to the film plane. The results show that utilizing
HiPIMS for deposition of the Py layer leads to a minimum interface mixing
between individual layers compared to dcMS deposition performed at sputter
power. This is associated with the smooth surface of Py deposited by HiPIMS.
However, this sharp interface results in higher coercivity and an opening in
the hard axis hysteresis loops while multilayers with intermixing present well
defined in-plane uniaxial anisotropy i.e. a linear hard axis. Comparison with
Py/Cu and Py/CuPt multilayers, prepared under identical conditions using
HiPIMS, suggests that poor in-plane uniaxial anisotropy is obtained in the
Py/Pt case, caused by the inverse magnetostriction arising from the large
lattice mismatch between Py and Pt. The Py/Pt multilayers that exhibit
interface mixing have a more relaxed interface and thus presents negligible
inverse magnetostriction and have better defined anisotropy.
