  Evaporating droplets and films are used in applications from different
fields. Various methods of evaporative self-assembly are of particular
interest. The paper describes a mathematical model of mass transfer in a
droplet drying on a substrate based on the lubrication approximation. The model
takes into account the transfer of a dissolved or suspended substance by a
capillary flow, the diffusion of this substance, the evaporation of liquid, the
formation of solid deposit, the dependence of the viscosity and the vapor flux
density on the admixture concentration. The case with pinning of the
three-phase boundary is considered here. Explicit and implicit
finite-difference schemes have been developed for the model equations. A
modification of the numerical method is proposed, in which splitting by
physical processes, the iterative method of explicit relaxation and Thomas
algorithm are combined. A practical recipe for suppressing sawtooth
oscillations is described using the example of a specific problem. A software
module in C++ has been developed, which can be used for evaporative lithography
problems in the future. With the help of this module, numerical calculations
were carried out, the results of which were compared with the results obtained
in the Maple package. Numerical simulation predicted the case in which the
direction of the capillary flow changes to the opposite over time due to a
change in the sign of the gradient of the vapor flux density. This can lead to
a slowdown in the transfer of the substance to the periphery, which as a result
will contribute to the formation of a more or less uniform precipitation over
the entire contact area of the droplet with the substrate. This observation is
useful for improving methods of annular deposit suppression associated with the
coffee-ring effect and undesirable for some applications, such as inkjet
printing or coating.
