  Traceability to the International System of Units (SI) is fundamental to
measurement accuracy and reliability. In this study, we demonstrate
subnanometer traceability of localization microscopy, establishing a
metrological foundation for the maturation and application of super-resolution
methods. To do so, we create a master standard by measuring the positions of
submicrometer apertures in an array by traceable atomic-force microscopy. We
perform correlative measurements of this master standard by optical microscopy,
calibrating scale factor and correcting aberration effects. We introduce the
concept of a localization uncertainty field due to optical localization errors
and scale factor uncertainty, with regions of position traceability to within a
68 % coverage interval of +/- 1 nm. These results enable localization metrology
with high throughput, which we apply to measure working standards that we
fabricate by electron-beam lithography, validating the accuracy of mean pitch
and closing the loop for disseminating and integrating reference arrays. We
then apply our novel methods to calibrate an optical microscope with a sample
cryostat, accounting for thermal contraction by use of a submicrometer pillar
array in silicon as a reference material and elucidating complex distortion.
This new calibration enables the accurate integration of quantum emitters and
photonic structures with high yield, as we demonstrate theoretically through
simulations of the dependence of the Purcell factor of radiative enhancement on
registration errors across a wide field. Our study illuminates the challenges
and opportunities of achieving traceable localization for comparison of
position data across lithography and microscopy systems, from ambient to
cryogenic temperatures.
