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Plasma and synchrotron sources of extreme UV

Lasers have been used to indirectly generate non-coherent extreme UV (E‑UV) radiation at 13.5 nm for extreme ultraviolet lithography. The E‑UV is not emitted by the laser, but rather by electron transitions in an extremely hot tin or xenon plasma, which is excited by an excimer laser. This technique does not require a synchrotron, yet can produce UV at the edge of the X‑ray spectrum. Synchrotron light sources can also produce all wavelengths of UV, including those at the boundary of the UV and X‑ray spectra at 10 nm.