Instruct: Identify the main and secondary category of Arxiv papers based on the titles and abstracts
Query: Atom lithography using MRI-type feature placement   We demonstrate the use of frequency-encoded light masks in neutral atom
lithography. We demonstrate that multiple features can be patterned across a
monotonic potential gradient. Features as narrow as 0.9 microns are fabricated
on silicon substrates with a metastable argon beam. Internal state manipulation
with such a mask enables continuously adjustable feature positions and feature
densities not limited by the optical wavelength, unlike previous light masks.

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The categories of this paper are: hep-lat
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The categories of this paper are: ao-sci
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The categories of this paper are: acc-phys
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The categories of this paper are: chem-ph
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The categories of this paper are: gr-qc
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The categories of this paper are: nlin
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The categories of this paper are: adap-org
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The categories of this paper are: cs
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The categories of this paper are: alg-geom
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The categories of this paper are: plasm-ph
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The categories of this paper are: nucl-ex
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The categories of this paper are: funct-an
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The categories of this paper are: quant-ph
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The categories of this paper are: solv-int
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The categories of this paper are: comp-gas
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The categories of this paper are: patt-sol