Instruct: Identify the main and secondary category of Arxiv papers based on the titles and abstracts
Query: Nano-artifact metrics based on random collapse of resist   Artifact metrics is an information security technology that uses the
intrinsic characteristics of a physical object for authentication and clone
resistance. Here, we demonstrate nano-artifact metrics based on silicon
nanostructures formed via an array of resist pillars that randomly collapse
when exposed to electron-beam lithography. The proposed technique uses
conventional and scalable lithography processes, and because of the random
collapse of resist, the resultant structure has extremely fine-scale morphology
with a minimum dimension below 10 nm, which is less than the resolution of
current lithography capabilities. By evaluating false match, false non-match
and clone-resistance rates, we clarify that the nanostructured patterns based
on resist collapse satisfy the requirements for high-performance security
applications.

14
The categories of this paper are: math-ph
2
The categories of this paper are: math
11
The categories of this paper are: hep-lat
19
The categories of this paper are: eess
31
The categories of this paper are: ao-sci
25
The categories of this paper are: patt-sol
8
The categories of this paper are: hep-ex
33
The categories of this paper are: plasm-ph
5
The categories of this paper are: gr-qc
9
The categories of this paper are: nlin
24
The categories of this paper are: dg-ga
34
The categories of this paper are: chem-ph
20
The categories of this paper are: acc-phys
7
The categories of this paper are: hep-th
29
The categories of this paper are: funct-an
17
The categories of this paper are: q-fin