Instruct: Identify the main and secondary category of Arxiv papers based on the titles and abstracts
Query: Fabrication of three-dimensional high-aspect-ratio structures by
  oblique-incidence Talbot lithography   Developing a suitable production method for three-dimensional periodic
nanostructures with high aspect ratios is a subject of growing interest. For
mass production, Talbot lithography offers many advantages. However, one
disadvantage is that the minimum period of the light intensity distribution is
limited by the period of the diffraction grating used. To enhance the aspect
ratio of fabricated nanostructures, in the present study we focus on multi-wave
interference between diffracted waves created using the Talbot effect. We
propose a unique exposure method to generate multi-wave interference between
adjacent diffraction orders by controlling the angle of incidence of an
ultraviolet (UV) light source. Using finite-difference time-domain simulations,
we obtain fringe patterns with a sub-wavelength period using a one-dimensional
periodic grating mask. Moreover, we demonstrate the practical application of
this approach by using UV lithography to fabricate sub-wavelength periodic
structures with an aspect ratio of 30 in millimeter-scale areas, indicating its
suitability for mass production.

20
The categories of this paper are: acc-phys
22
The categories of this paper are: chao-dyn
37
The categories of this paper are: supr-con
2
The categories of this paper are: math
30
The categories of this paper are: q-alg
28
The categories of this paper are: alg-geom
31
The categories of this paper are: ao-sci
34
The categories of this paper are: chem-ph
35
The categories of this paper are: mtrl-th
19
The categories of this paper are: eess
33
The categories of this paper are: plasm-ph
12
The categories of this paper are: nucl-th
29
The categories of this paper are: funct-an
32
The categories of this paper are: atom-ph
15
The categories of this paper are: nucl-ex
23
The categories of this paper are: solv-int