Datasets:

Taylor658
/

SiN-photonic-waveguide-loss-efficiency

Dataset card Data Studio Files Files and versions Community

Split (1)

train · 90k rows

waveguide_width float32 0.5 2	waveguide_height float32 200 600	cladding_material stringclasses 3 values	cladding_thickness float32 1 5	deposition_method stringclasses 3 values	etch_method stringclasses 3 values	sidewall_roughness float32 0.5 5	annealing_params stringclasses 4 values	wavelength float32 1.5k 1.6k	polarization stringclasses 2 values	input_power float32 -10 10	temperature float32 20 80	bend_radius float32 20 200	device_length float32 1 50	insertion_loss float32 0.53 26.5	propagation_loss float32 0.1 5	coupling_efficiency_input float32 40 90	coupling_efficiency_output float32 40 90	scattering_loss float32 0.01 0.5	effective_index float32 1.5 2	mode_confinement_factor float32 0.7 0.95	batch_id stringclasses 50 values	data_source stringclasses 2 values	measurement_method stringclasses 4 values	uncertainty float32 0.01 0.2
0.663	527.219971	Air	1.08	LPCVD	RIE	0.6	900C_1hr	1,578.670044	TE	-7.61	65.510002	150.869995	32.889999	3.687	0.584	89.57	52.610001	0.392	1.595	0.827	BATCH_37	Measurement	OTDR	0.151
1.246	532	Air	3.35	Sputtering	ICP	1.62	900C_1hr	1,542.949951	TM	-6.01	57.709999	68.370003	29.1	10.55	3.389	79.949997	45.619999	0.023	1.557	0.824	BATCH_23	Synthetic	microring_Q	0.098
0.755	323.630005	SiO2	4.45	PECVD	RIE	3.83	1000C_1hr	1,508.900024	TM	-5.94	55.830002	143.550003	5.08	2.599	2.965	68.089996	81.32	0.025	1.635	0.838	BATCH_3	Synthetic	cut-back	0.082
1.67	506.220001	Air	3.75	Sputtering	ICP	4.27	900C_1hr	1,506.5	TE	3.98	53.459999	191.970001	35.470001	9.543	2.383	77.510002	50.450001	0.168	1.692	0.759	BATCH_15	Synthetic	ring_resonance	0.136
1.968	289.790009	Polymer	2.55	Sputtering	RIE	2.82	900C_1hr	1,540.959961	TM	-6.23	23.58	192.440002	4.58	3.121	3.458	65.75	56.990002	0.272	1.589	0.909	BATCH_5	Measurement	microring_Q	0.045
1.654	343.589996	Polymer	1.06	LPCVD	RIE	4.31	No_Anneal	1,526.72998	TM	-7.26	56.779999	133.520004	31.85	2.375	0.176	72.239998	54.950001	0.051	1.839	0.822	BATCH_26	Measurement	cut-back	0.087
0.901	275.109985	Air	1.34	LPCVD	ICP	1.74	900C_1hr	1,554.849976	TM	-6.17	53.060001	96.949997	14.65	2.957	1.016	86.150002	82.730003	0.38	1.818	0.796	BATCH_22	Measurement	cut-back	0.167
1.428	593.599976	Air	3.81	Sputtering	RIE	2.7	900C_1hr	1,564.02002	TE	0.47	49.560001	79.089996	12.82	2.827	0.679	86.540001	89.75	0.292	1.653	0.752	BATCH_44	Measurement	OTDR	0.053
1.483	387.709991	Air	3.84	LPCVD	ICP	1.69	900C_1hr	1,517.170044	TM	-2.77	52.43	155.720001	21.35	6.03	2.194	59.939999	83.949997	0.087	1.726	0.92	BATCH_19	Measurement	ring_resonance	0.023
1.208	465.76001	SiO2	3.43	LPCVD	RIE	1.64	900C_3hr	1,583.689941	TE	-5.33	66.389999	162.309998	12.77	4.787	2.329	63.139999	72.309998	0.191	1.885	0.798	BATCH_38	Synthetic	OTDR	0.071
1.719	424.01001	Air	4.59	PECVD	RIE	3.43	900C_3hr	1,542.089966	TM	3.85	40.459999	24.190001	45.599998	7.551	1.4	60.169998	80.260002	0.482	1.614	0.921	BATCH_22	Measurement	cut-back	0.142
1.926	438.769989	Polymer	4.43	PECVD	ICP	2.51	No_Anneal	1,537.27002	TE	-4.16	59.709999	26.59	47.009998	16.572001	3.102	49.040001	84.419998	0.253	1.644	0.732	BATCH_9	Synthetic	OTDR	0.102
0.752	588.710022	SiO2	1.4	PECVD	Wet Etch	1.26	No_Anneal	1,564.569946	TM	-8.65	72.010002	159.610001	28.65	10.18	2.87	44.169998	63.25	0.48	1.899	0.927	BATCH_6	Measurement	microring_Q	0.169
0.82	239	Polymer	3.9	PECVD	Wet Etch	3.89	900C_1hr	1,522.359985	TE	2.35	68.089996	63.959999	5.41	3.645	3.915	59.560001	62.549999	0.032	1.729	0.764	BATCH_45	Synthetic	microring_Q	0.147
0.532	264.359985	SiO2	1.06	LPCVD	ICP	4.16	No_Anneal	1,538.790039	TM	-6.77	26.950001	29.5	39.240002	9.282	2.039	81.150002	50.400002	0.042	1.674	0.87	BATCH_17	Measurement	OTDR	0.174
1.616	311.799988	Air	3.02	PECVD	Wet Etch	0.58	1000C_1hr	1,533.48999	TM	-1.8	44.93	38.720001	11.32	6.845	4.536	58.540001	70.260002	0.112	1.883	0.736	BATCH_28	Measurement	OTDR	0.094
0.766	380.559998	SiO2	2.7	LPCVD	ICP	0.95	900C_1hr	1,569.859985	TE	-3.71	46.419998	67.790001	34.990002	5.328	1.099	74.089996	78.68	0.185	1.848	0.733	BATCH_13	Measurement	OTDR	0.12
0.905	210.830002	Polymer	2.37	PECVD	Wet Etch	2.31	900C_3hr	1,511.420044	TE	-5.16	30.030001	72.230003	45.41	10.023	1.861	84.330002	51.959999	0.269	1.544	0.935	BATCH_45	Measurement	microring_Q	0.143
1.038	395.690002	Polymer	4.41	Sputtering	RIE	4.19	900C_3hr	1,545.48999	TM	-6.64	28.200001	145.679993	29.219999	12.599	4.11	78.93	40.639999	0.197	1.762	0.787	BATCH_10	Measurement	OTDR	0.018
1.753	536.22998	SiO2	3.65	PECVD	RIE	2.48	900C_3hr	1,520.920044	TE	-5.57	22.15	166.029999	19.709999	5.816	2.107	46.34	40.91	0.229	1.775	0.84	BATCH_50	Measurement	ring_resonance	0.115
1.386	233.630005	Polymer	2.65	PECVD	RIE	3.36	900C_1hr	1,557.48999	TM	0.68	70.279999	168.199997	28.6	14.47	4.685	40.099998	47.540001	0.315	1.52	0.794	BATCH_17	Measurement	microring_Q	0.066
1.447	562.539978	SiO2	2.97	Sputtering	ICP	4.11	900C_3hr	1,537.369995	TE	-3.08	28.389999	114.779999	34.169998	6.386	1.703	89.260002	57.91	0.395	1.593	0.806	BATCH_21	Measurement	OTDR	0.13
1.671	388.019989	Polymer	1.76	Sputtering	RIE	3.17	900C_3hr	1,597.01001	TE	-5.56	72.940002	152.470001	10.36	2.171	0.175	45.73	60.23	0.034	1.595	0.881	BATCH_38	Measurement	cut-back	0.051
0.979	545.440002	SiO2	4.72	PECVD	Wet Etch	4.57	900C_3hr	1,570.650024	TE	-7.76	35.34	196.009995	30.34	14.377	4.535	79.809998	40.639999	0.414	1.79	0.839	BATCH_3	Synthetic	cut-back	0.072
1.072	325.029999	Polymer	3.89	LPCVD	ICP	0.96	No_Anneal	1,583.369995	TE	3.48	69.870003	101.300003	9.86	2.53	1.478	56.23	52.209999	0.105	1.586	0.773	BATCH_41	Synthetic	microring_Q	0.025
0.884	295.269989	Air	3.87	LPCVD	RIE	2.76	900C_3hr	1,599.800049	TM	2.98	56.400002	60.869999	8.69	1.268	0.485	65.370003	80.220001	0.382	1.913	0.92	BATCH_34	Measurement	microring_Q	0.113
1.281	331.369995	SiO2	2.94	PECVD	Wet Etch	4.91	No_Anneal	1,561.01001	TE	3.28	64.940002	130.889999	8.25	5.135	4.553	81.150002	84.099998	0.322	1.972	0.921	BATCH_34	Synthetic	microring_Q	0.142
1.631	383.079987	Polymer	2.15	LPCVD	Wet Etch	0.53	900C_1hr	1,547.300049	TM	7.7	65.099998	80.769997	16.83	6.746	2.957	89.260002	49.779999	0.453	1.505	0.758	BATCH_11	Measurement	OTDR	0.04
1.803	548.700012	SiO2	2.68	PECVD	Wet Etch	3.27	900C_1hr	1,560.680054	TE	-8.88	76.68	46.380001	26.610001	3.666	1.096	82.879997	54.369999	0.282	1.918	0.793	BATCH_26	Synthetic	cut-back	0.098
0.528	555.169983	Polymer	3.68	PECVD	Wet Etch	1.21	900C_3hr	1,568.060059	TE	6.06	42.57	159.779999	47.860001	2.108	0.146	64.089996	71.540001	0.143	1.578	0.776	BATCH_48	Synthetic	cut-back	0.098
1.875	503.809998	Polymer	1.6	PECVD	Wet Etch	4.4	No_Anneal	1,594.579956	TM	-4.11	40.77	101.089996	10.32	1.92	0.705	41.119999	40.450001	0.354	1.678	0.788	BATCH_5	Synthetic	microring_Q	0.102
1.602	201.820007	Air	1.91	LPCVD	Wet Etch	1.91	No_Anneal	1,557.27002	TE	0.45	24.879999	166.630005	31.26	6.71	1.552	43.57	68.669998	0.205	1.666	0.94	BATCH_25	Measurement	microring_Q	0.175
1.168	447.029999	Air	2.79	PECVD	Wet Etch	3.23	900C_3hr	1,563.390015	TE	9.07	47.52	78.480003	9.37	5.298	3.57	74.209999	53.889999	0.49	1.664	0.946	BATCH_15	Measurement	cut-back	0.092
1.62	282.649994	Polymer	4.73	LPCVD	ICP	1.54	No_Anneal	1,513.719971	TM	-8.44	41.830002	65.160004	20.110001	8.411	3.787	73.360001	83.290001	0.443	1.895	0.762	BATCH_35	Synthetic	ring_resonance	0.177
0.635	395.959991	Air	2.55	Sputtering	ICP	1.45	1000C_1hr	1,588.410034	TM	7.54	35.77	75.910004	13.4	3.487	1.463	84.099998	46.860001	0.13	1.949	0.927	BATCH_37	Measurement	ring_resonance	0.17
1.161	317.609985	Air	3.34	Sputtering	ICP	2.52	1000C_1hr	1,577.560059	TM	-8.94	40.93	108.82	16.139999	7.945	3.885	70.260002	53.07	0.283	1.854	0.737	BATCH_23	Measurement	cut-back	0.061
1.223	451.700012	Air	4.56	PECVD	Wet Etch	2.23	1000C_1hr	1,573.170044	TE	-4.45	72.410004	77.089996	25.129999	4.678	1.458	77.059998	89.879997	0.354	1.54	0.757	BATCH_2	Synthetic	ring_resonance	0.097
1.973	555.840027	Polymer	4.59	Sputtering	Wet Etch	0.78	No_Anneal	1,502.280029	TM	8.91	30.860001	32.889999	20.559999	1.917	0.267	78.580002	51.48	0.203	1.696	0.803	BATCH_20	Measurement	cut-back	0.075
1.141	576.820007	SiO2	3.53	PECVD	ICP	3.92	No_Anneal	1,569.25	TM	5.95	58.950001	184.729996	38.700001	2.554	0.152	53.049999	66.419998	0.495	1.627	0.788	BATCH_29	Synthetic	microring_Q	0.095
0.908	371	Air	1.52	LPCVD	RIE	1.57	1000C_1hr	1,546.209961	TE	2.18	55.150002	167.919998	19.040001	3.871	1.568	75.339996	70.879997	0.28	1.592	0.745	BATCH_39	Measurement	cut-back	0.138
0.628	290.130005	SiO2	4.1	LPCVD	ICP	3.52	1000C_1hr	1,519.849976	TM	-7.74	20.85	198.839996	31.27	4.341	1.12	80.889999	51.130001	0.231	1.719	0.896	BATCH_46	Synthetic	OTDR	0.124
1.246	271.179993	Air	4.19	Sputtering	RIE	4.91	1000C_1hr	1,502.930054	TM	0.3	62.57	50.43	26.82	3.095	0.543	42.82	46.709999	0.242	1.793	0.929	BATCH_3	Synthetic	OTDR	0.017
1.32	268.75	Air	4.53	LPCVD	Wet Etch	0.91	900C_1hr	1,539.079956	TM	-1.45	26.58	25.26	8.39	3.79	3.226	88.32	55.709999	0.012	1.884	0.926	BATCH_11	Synthetic	OTDR	0.046
0.905	368.75	Polymer	2.7	PECVD	ICP	2.89	900C_1hr	1,530.439941	TM	1.8	66.940002	188.220001	1.82	1.523	1.494	43.669998	61.959999	0.487	1.824	0.777	BATCH_26	Synthetic	ring_resonance	0.045
1.298	554.599976	Polymer	4.72	LPCVD	ICP	3.15	900C_3hr	1,515.930054	TE	2.17	68.910004	179.789993	13.54	7.321	4.727	47.84	49.549999	0.046	1.984	0.884	BATCH_14	Synthetic	microring_Q	0.115
1.353	377.029999	Air	1.07	LPCVD	ICP	2.48	900C_1hr	1,516.76001	TE	7.52	24.700001	88.519997	27.879999	2.903	0.568	82.220001	70.339996	0.323	1.958	0.733	BATCH_43	Measurement	ring_resonance	0.024
1.703	220.949997	SiO2	2	LPCVD	RIE	3.71	900C_1hr	1,587.069946	TE	9.45	39.209999	198.389999	33.5	8.01	2.031	60.91	70.120003	0.139	1.956	0.933	BATCH_34	Synthetic	cut-back	0.159
1.297	221.399994	SiO2	1.62	LPCVD	Wet Etch	0.85	1000C_1hr	1,559.319946	TE	-7.58	23.08	195.100006	44.040001	12.671	2.699	89.879997	82.190002	0.098	1.587	0.91	BATCH_16	Synthetic	microring_Q	0.154
1.35	326.619995	SiO2	2.21	LPCVD	Wet Etch	3.34	No_Anneal	1,504.290039	TE	-3.45	61.439999	41.970001	11.15	5.127	2.828	71.190002	58.02	0.403	1.507	0.73	BATCH_17	Synthetic	microring_Q	0.193
1.124	420.109985	Air	2.04	PECVD	RIE	1.7	1000C_1hr	1,598.22998	TE	6.07	78.260002	47.990002	47.849998	18.966999	3.776	42.25	73.43	0.351	1.778	0.921	BATCH_19	Measurement	microring_Q	0.076
1.64	583.210022	Polymer	3.45	Sputtering	ICP	4.55	No_Anneal	1,538.790039	TE	-6.84	20.73	186.5	18.860001	7.668	3.456	44.900002	74.220001	0.3	1.914	0.815	BATCH_18	Synthetic	OTDR	0.066
1.661	501.600006	Polymer	4.55	PECVD	Wet Etch	3.59	No_Anneal	1,559.25	TM	4.58	73.919998	87.769997	14.19	1.859	0.153	57.09	70.089996	0.414	1.792	0.889	BATCH_19	Measurement	ring_resonance	0.099
1.017	474.429993	Polymer	1.91	PECVD	RIE	1.9	900C_1hr	1,543.089966	TM	-3.29	46.470001	126.339996	9.95	1.92	0.537	56.189999	44.869999	0.118	1.919	0.926	BATCH_39	Measurement	ring_resonance	0.152
1.357	400.119995	Air	1.14	PECVD	Wet Etch	3.08	1000C_1hr	1,554.439941	TM	-1.96	20.309999	189.830002	7.19	2.762	1.253	81.639999	42.849998	0.364	1.622	0.908	BATCH_45	Synthetic	OTDR	0.046
1.998	318.779999	SiO2	1.32	LPCVD	ICP	3.92	No_Anneal	1,568.040039	TE	-2.52	26.889999	83.580002	5.4	2.113	1.794	48.07	58.389999	0.054	1.919	0.806	BATCH_47	Measurement	cut-back	0.089
1.387	560.960022	Polymer	3.59	Sputtering	Wet Etch	4.34	No_Anneal	1,591.23999	TE	7.24	22.32	130.460007	28.129999	4.817	1.098	54.869999	86.080002	0.073	1.987	0.735	BATCH_45	Synthetic	OTDR	0.134
1.017	513.609985	SiO2	2.37	LPCVD	RIE	4.08	900C_3hr	1,524.300049	TM	-4.85	32.880001	99.419998	42.880001	12.361	2.579	43.98	85.510002	0.36	1.586	0.864	BATCH_12	Measurement	microring_Q	0.104
1.282	379.040009	Polymer	3.95	LPCVD	Wet Etch	0.51	900C_3hr	1,558.030029	TM	-8.02	78.650002	111.519997	47.130001	20.554001	3.97	56.43	59.77	0.256	1.748	0.74	BATCH_48	Measurement	ring_resonance	0.017
0.764	467.380005	Polymer	4.21	Sputtering	RIE	3.21	1000C_1hr	1,560.550049	TM	-3.86	57.990002	84.599998	47.77	21.856001	4.195	87.379997	60.18	0.059	1.823	0.923	BATCH_38	Measurement	microring_Q	0.139
1.998	321.859985	Air	2.03	Sputtering	RIE	1.86	No_Anneal	1,570.859985	TM	-2.56	44.450001	53.48	9.19	4.638	4.186	55.68	59.07	0.484	1.875	0.86	BATCH_15	Synthetic	cut-back	0.172
1.309	313.309998	SiO2	3.92	LPCVD	ICP	4.43	900C_3hr	1,516.089966	TE	-7.58	67.93	180.050003	18.610001	5.388	2.258	84.279999	42.41	0.489	1.802	0.751	BATCH_38	Measurement	ring_resonance	0.13
0.915	430.850006	SiO2	4.94	Sputtering	RIE	2.99	900C_3hr	1,543.180054	TE	7.12	41.790001	26.700001	2.93	2.401	4.391	58.669998	40.09	0.252	1.814	0.759	BATCH_10	Measurement	microring_Q	0.078
1.847	528.530029	SiO2	3.58	LPCVD	ICP	4.64	No_Anneal	1,566.040039	TM	-3.43	30.32	81.400002	14.13	6.865	4.004	50.549999	43.470001	0.405	1.928	0.814	BATCH_31	Synthetic	cut-back	0.015
0.782	241.960007	SiO2	2.38	Sputtering	Wet Etch	3.39	No_Anneal	1,531.73999	TE	-2.34	57	159.199997	20.99	7.697	2.949	49.139999	50.84	0.453	1.915	0.837	BATCH_11	Synthetic	ring_resonance	0.095
1.524	368.859985	Polymer	4.85	Sputtering	RIE	3.02	900C_1hr	1,583.609985	TE	8.37	72.580002	99.489998	47.869999	11.033	1.98	72.839996	47.310001	0.068	1.694	0.753	BATCH_9	Synthetic	OTDR	0.069
1.756	550.200012	SiO2	3.17	LPCVD	ICP	3.9	900C_1hr	1,511.869995	TM	9.42	64.559998	68.629997	11.99	2.464	0.646	47.650002	58.299999	0.222	1.889	0.855	BATCH_9	Measurement	cut-back	0.065
0.907	359.179993	Air	4.4	PECVD	Wet Etch	4.65	No_Anneal	1,501.430054	TM	-9.72	36.009998	104	31.66	8.389	2.16	47.59	86.989998	0.011	1.594	0.895	BATCH_19	Synthetic	microring_Q	0.19
1.616	210.100006	Air	2.42	LPCVD	ICP	1.76	1000C_1hr	1,517	TM	-8.85	36.389999	127.32	17.15	4.353	1.934	61	67.709999	0.23	1.61	0.933	BATCH_39	Measurement	ring_resonance	0.044
1.084	239.820007	Polymer	4	Sputtering	RIE	1.54	900C_3hr	1,597.01001	TE	-9.68	39.299999	196.089996	45.849998	10.412	2.151	86.330002	72.059998	0.487	1.794	0.735	BATCH_1	Measurement	ring_resonance	0.036
0.514	404.350006	Air	1.87	Sputtering	Wet Etch	2.78	900C_3hr	1,587.689941	TM	-9.69	39.68	38.209999	16.75	8.78	4.307	41.93	52.639999	0.343	1.861	0.721	BATCH_15	Measurement	microring_Q	0.086
1.38	353.429993	SiO2	1.08	LPCVD	Wet Etch	3.67	900C_1hr	1,501.030029	TE	7.85	23.129999	57.34	40.799999	4.751	0.945	72.120003	60.099998	0.373	1.933	0.881	BATCH_11	Synthetic	microring_Q	0.104
1.57	414.140015	Polymer	3.12	Sputtering	ICP	0.56	900C_3hr	1,540.069946	TE	-9.31	74.269997	131.279999	13.43	6.501	3.963	57.810001	80.690002	0.429	1.774	0.883	BATCH_26	Synthetic	cut-back	0.056
1.231	353.609985	Polymer	4.35	PECVD	ICP	4.45	900C_3hr	1,528.359985	TM	5.61	44.400002	166.929993	4.83	2.177	2.103	79.199997	43.09	0.387	1.782	0.845	BATCH_49	Synthetic	ring_resonance	0.062
0.613	232.039993	Polymer	2.22	Sputtering	ICP	2.05	900C_1hr	1,585.609985	TM	-9.82	77.800003	139.300003	27.469999	6.038	1.774	46.82	46.400002	0.174	1.923	0.937	BATCH_7	Synthetic	microring_Q	0.164
1.389	332.76001	Polymer	3.78	LPCVD	ICP	4.78	No_Anneal	1,525.449951	TM	-0.27	54.849998	193.229996	28.620001	13.063	3.867	61.169998	84.349998	0.097	1.564	0.71	BATCH_7	Measurement	microring_Q	0.013
1.12	417.290009	Air	1.83	Sputtering	RIE	3.77	1000C_1hr	1,588.199951	TE	-0.59	74.910004	60.759998	5.76	3.677	4.472	68.059998	49.639999	0.047	1.769	0.706	BATCH_29	Synthetic	ring_resonance	0.154
0.646	432.779999	Polymer	4.38	PECVD	RIE	1.11	900C_3hr	1,521.569946	TM	-7.11	35.529999	113.129997	5.86	3.12	2.19	41.07	51.139999	0.426	1.661	0.862	BATCH_35	Synthetic	microring_Q	0.098
0.725	200.509995	Polymer	1.96	PECVD	ICP	2.66	900C_3hr	1,501.810059	TM	2.84	73.900002	90.559998	41.040001	2.49	0.152	88.230003	40.740002	0.219	1.643	0.82	BATCH_40	Synthetic	microring_Q	0.192
1.584	387.359985	SiO2	2.76	Sputtering	Wet Etch	2.78	1000C_1hr	1,541.280029	TM	-3.98	44.810001	89.25	44	9.903	2.121	85.75	76.580002	0.464	1.774	0.921	BATCH_44	Synthetic	OTDR	0.028
1.521	578.280029	SiO2	2.39	Sputtering	Wet Etch	1.35	No_Anneal	1,580.540039	TE	6.49	67.779999	115.160004	4.85	3.518	3.486	56	70.309998	0.497	1.625	0.735	BATCH_32	Measurement	cut-back	0.074
1.605	421.320007	Air	3.03	PECVD	RIE	1.1	900C_1hr	1,543.949951	TE	4.33	24.82	149.509995	31.27	8.335	2.151	76.730003	55.27	0.269	1.93	0.877	BATCH_28	Measurement	microring_Q	0.113
0.815	302.049988	Air	2.29	LPCVD	RIE	3.59	900C_1hr	1,544.76001	TE	-2.22	42.990002	138.429993	22.35	11.866	4.479	84.779999	43.919998	0.105	1.589	0.777	BATCH_1	Measurement	microring_Q	0.153
1.934	272.320007	SiO2	2.78	LPCVD	Wet Etch	3.91	1000C_1hr	1,538.780029	TM	-7.55	20.389999	144.190002	33.189999	13.821	3.859	83.93	81.849998	0.264	1.922	0.89	BATCH_33	Synthetic	ring_resonance	0.129
1.441	490.130005	SiO2	2.22	PECVD	Wet Etch	1.09	900C_1hr	1,507.540039	TM	-1.59	66.940002	80.32	7.52	1.109	0.655	73.879997	82	0.304	1.844	0.707	BATCH_39	Measurement	cut-back	0.133
0.989	540.969971	SiO2	4.39	PECVD	ICP	4.34	1000C_1hr	1,524.109985	TE	-1.97	27.65	71.910004	38.919998	8.382	2.021	48.689999	71.410004	0.456	1.775	0.767	BATCH_1	Measurement	cut-back	0.14
0.514	466.779999	Air	2.68	LPCVD	RIE	1.86	900C_3hr	1,530.73999	TE	-3.56	27.549999	99.43	2.07	2.24	4.566	44.450001	59.040001	0.052	1.544	0.918	BATCH_22	Measurement	ring_resonance	0.194
1.24	200.539993	SiO2	1.54	PECVD	Wet Etch	1.81	No_Anneal	1,586.050049	TM	9.36	55.299999	137.399994	12.51	7.302	4.94	63.630001	66.580002	0.221	1.799	0.884	BATCH_20	Measurement	ring_resonance	0.128
1.629	525.210022	Polymer	3.97	LPCVD	Wet Etch	3.27	900C_3hr	1,582.469971	TM	0.87	49.959999	30.02	14.75	8.788	4.896	40.009998	84.550003	0.32	1.706	0.884	BATCH_26	Synthetic	cut-back	0.03
0.676	501.149994	Air	3.87	Sputtering	RIE	2	900C_1hr	1,582.26001	TE	-2.78	78.940002	182.619995	26.58	12.971	4.189	56.84	62.310001	0.011	1.977	0.754	BATCH_41	Synthetic	OTDR	0.116
1.015	387.98999	Polymer	2.76	PECVD	Wet Etch	4.32	900C_3hr	1,558.589966	TM	-0.12	39.060001	85.75	23.940001	13.49	4.921	66.800003	71.269997	0.027	1.648	0.768	BATCH_25	Measurement	ring_resonance	0.161
1.981	500.369995	SiO2	1.45	PECVD	Wet Etch	4.9	900C_3hr	1,515.430054	TE	-5.15	53.77	61.419998	12.96	5.399	2.835	81.720001	86.089996	0.128	1.806	0.865	BATCH_44	Measurement	cut-back	0.113
1.529	202.839996	Polymer	1.75	LPCVD	ICP	1.47	1000C_1hr	1,567.119995	TM	0.01	54.459999	76.400002	19.799999	9.584	4.37	66.580002	87.400002	0.155	1.743	0.853	BATCH_29	Measurement	microring_Q	0.037
0.65	239.919998	Air	4.35	Sputtering	Wet Etch	3.89	No_Anneal	1,579.329956	TM	-3.67	53.049999	105.029999	26.940001	7.314	2.372	41.759998	84.669998	0.172	1.842	0.741	BATCH_10	Synthetic	OTDR	0.104
1.309	355.720001	Polymer	3.61	Sputtering	ICP	2.12	900C_1hr	1,506.140015	TE	-9.38	37.709999	127.330002	39.66	7.538	1.46	49.389999	79.57	0.118	1.647	0.907	BATCH_33	Synthetic	OTDR	0.155
0.717	242.919998	SiO2	4.44	Sputtering	RIE	2.19	No_Anneal	1,564.910034	TM	-9.68	68.5	58.509998	6.2	3.505	3.82	76.209999	76.419998	0.387	1.509	0.829	BATCH_16	Measurement	cut-back	0.063
1.244	242.789993	Polymer	4.2	LPCVD	ICP	0.87	900C_3hr	1,584.349976	TE	-1.94	51.439999	153.279999	8.39	1.615	1.27	81.290001	67.839996	0.018	1.605	0.729	BATCH_14	Measurement	ring_resonance	0.058
1.673	515.090027	Polymer	4.88	LPCVD	Wet Etch	3.39	900C_3hr	1,587.76001	TM	-7.2	75.870003	81.529999	9.51	4.745	3.459	78.300003	44.650002	0.314	1.788	0.829	BATCH_41	Synthetic	ring_resonance	0.198
1.381	401.290009	SiO2	1.34	PECVD	Wet Etch	2.55	900C_1hr	1,556.310059	TM	-2.57	26.07	84.739998	12.22	4.313	2.262	89.040001	55.459999	0.489	1.545	0.877	BATCH_44	Synthetic	microring_Q	0.068
0.986	335.149994	SiO2	1.48	PECVD	Wet Etch	3.35	No_Anneal	1,507.369995	TE	-9.14	22.219999	112.029999	5.12	2.255	1.827	70.230003	59.689999	0.022	1.919	0.878	BATCH_49	Synthetic	ring_resonance	0.059
0.874	577.780029	SiO2	1.79	PECVD	ICP	2.12	No_Anneal	1,539.77002	TE	-4.59	22.98	192.880005	41.599998	9.747	1.945	68.650002	79.699997	0.398	1.922	0.874	BATCH_18	Measurement	ring_resonance	0.118

Subsets and Splits

No community queries yet

The top public SQL queries from the community will appear here once available.