waveguide_width
float32 0.5
2
| waveguide_height
float32 200
600
| cladding_material
stringclasses 3
values | cladding_thickness
float32 1
5
| deposition_method
stringclasses 3
values | etch_method
stringclasses 3
values | sidewall_roughness
float32 0.5
5
| annealing_params
stringclasses 4
values | wavelength
float32 1.5k
1.6k
| polarization
stringclasses 2
values | input_power
float32 -10
10
| temperature
float32 20
80
| bend_radius
float32 20
200
| device_length
float32 1
50
| insertion_loss
float32 0.53
26.5
| propagation_loss
float32 0.1
5
| coupling_efficiency_input
float32 40
90
| coupling_efficiency_output
float32 40
90
| scattering_loss
float32 0.01
0.5
| effective_index
float32 1.5
2
| mode_confinement_factor
float32 0.7
0.95
| batch_id
stringclasses 50
values | data_source
stringclasses 2
values | measurement_method
stringclasses 4
values | uncertainty
float32 0.01
0.2
|
---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
1.798 | 579.530029 |
SiO2
| 2.25 |
Sputtering
|
RIE
| 3.9 |
900C_1hr
| 1,567.719971 |
TE
| -7.53 | 49.509998 | 165.919998 | 19.6 | 3.551 | 0.874 | 51.25 | 55.759998 | 0.478 | 1.526 | 0.808 |
BATCH_3
|
Measurement
|
OTDR
| 0.03 |
1.586 | 368.600006 |
Polymer
| 1.63 |
LPCVD
|
RIE
| 3.55 |
900C_1hr
| 1,508.51001 |
TE
| 2.57 | 78.389999 | 142.699997 | 5.11 | 3.909 | 4.963 | 66.239998 | 64.120003 | 0.326 | 1.842 | 0.842 |
BATCH_8
|
Synthetic
|
ring_resonance
| 0.036 |
1.984 | 566.059998 |
SiO2
| 4.6 |
LPCVD
|
Wet Etch
| 1.13 |
900C_3hr
| 1,597.449951 |
TM
| 8.4 | 62.110001 | 175.490005 | 8.25 | 4.364 | 3.964 | 74.519997 | 85.650002 | 0.193 | 1.565 | 0.86 |
BATCH_1
|
Measurement
|
microring_Q
| 0.113 |
0.568 | 422.619995 |
SiO2
| 2.21 |
LPCVD
|
Wet Etch
| 1.46 |
1000C_1hr
| 1,579.25 |
TM
| -7.91 | 31.52 | 83.720001 | 38.59 | 14.047 | 3.429 | 76.540001 | 79.650002 | 0.211 | 1.942 | 0.829 |
BATCH_31
|
Measurement
|
microring_Q
| 0.056 |
1.767 | 428.579987 |
Air
| 2.51 |
Sputtering
|
ICP
| 4.75 |
900C_1hr
| 1,500.77002 |
TE
| 2.58 | 20.9 | 67.919998 | 20.950001 | 8.393 | 3.747 | 68.309998 | 82.050003 | 0.354 | 1.621 | 0.767 |
BATCH_13
|
Measurement
|
cut-back
| 0.148 |
0.979 | 475.589996 |
Air
| 1.02 |
Sputtering
|
ICP
| 2.04 |
900C_3hr
| 1,553.27002 |
TM
| 2.52 | 26.1 | 137.539993 | 38.25 | 2.592 | 0.368 | 73.839996 | 80.720001 | 0.33 | 1.667 | 0.718 |
BATCH_20
|
Measurement
|
OTDR
| 0.035 |
1.326 | 429.73999 |
SiO2
| 3.48 |
Sputtering
|
ICP
| 1.7 |
1000C_1hr
| 1,539.869995 |
TM
| -0.62 | 49.610001 | 106.150002 | 33.43 | 10.726 | 2.909 | 68.57 | 43.029999 | 0.027 | 1.603 | 0.76 |
BATCH_42
|
Synthetic
|
ring_resonance
| 0.058 |
1.027 | 403.660004 |
Polymer
| 2.51 |
LPCVD
|
Wet Etch
| 4.84 |
No_Anneal
| 1,590.069946 |
TM
| 4.55 | 42.27 | 196.570007 | 41.220001 | 19.993 | 4.53 | 78.870003 | 81.589996 | 0.252 | 1.572 | 0.812 |
BATCH_12
|
Measurement
|
OTDR
| 0.053 |
1.69 | 263.440002 |
Air
| 1.84 |
LPCVD
|
RIE
| 0.92 |
900C_3hr
| 1,541.060059 |
TE
| -1.28 | 20.66 | 27.799999 | 24.74 | 5.53 | 2.005 | 46.150002 | 66.440002 | 0.272 | 1.96 | 0.934 |
BATCH_8
|
Measurement
|
microring_Q
| 0.072 |
1.154 | 307.190002 |
SiO2
| 2.37 |
PECVD
|
Wet Etch
| 0.52 |
No_Anneal
| 1,559.310059 |
TM
| -7.82 | 60.080002 | 159.809998 | 8.9 | 2.179 | 1.659 | 66.129997 | 76.629997 | 0.498 | 1.734 | 0.78 |
BATCH_2
|
Synthetic
|
OTDR
| 0.129 |
1.969 | 212.839996 |
Air
| 4.98 |
PECVD
|
ICP
| 0.62 |
No_Anneal
| 1,516.540039 |
TM
| -4.23 | 44.509998 | 126.400002 | 5.11 | 1.703 | 0.504 | 67.669998 | 59.849998 | 0.158 | 1.896 | 0.821 |
BATCH_22
|
Measurement
|
microring_Q
| 0.088 |
1.778 | 409.540009 |
Polymer
| 3.67 |
PECVD
|
Wet Etch
| 2.31 |
900C_3hr
| 1,505.680054 |
TE
| 9.54 | 21.540001 | 94.830002 | 21.66 | 4.798 | 1.563 | 49.150002 | 88.07 | 0.23 | 1.622 | 0.862 |
BATCH_18
|
Synthetic
|
cut-back
| 0.15 |
0.806 | 254.949997 |
SiO2
| 1.9 |
LPCVD
|
Wet Etch
| 0.91 |
No_Anneal
| 1,521.449951 |
TM
| -1.42 | 75.68 | 143.690002 | 29.219999 | 3.768 | 0.87 | 76.82 | 84.660004 | 0.374 | 1.527 | 0.792 |
BATCH_15
|
Measurement
|
ring_resonance
| 0.071 |
1.639 | 260.329987 |
Polymer
| 1.53 |
Sputtering
|
Wet Etch
| 1.79 |
900C_1hr
| 1,581.939941 |
TM
| -9.45 | 76.660004 | 141.419998 | 41.82 | 18.671 | 4.207 | 58.380001 | 77.540001 | 0.399 | 1.764 | 0.763 |
BATCH_37
|
Measurement
|
microring_Q
| 0.141 |
1.77 | 525.690002 |
Polymer
| 4.65 |
LPCVD
|
Wet Etch
| 4.88 |
900C_1hr
| 1,576.030029 |
TE
| 6.41 | 77.839996 | 76 | 10.12 | 3.819 | 3.223 | 74.940002 | 66.169998 | 0.224 | 1.54 | 0.757 |
BATCH_20
|
Measurement
|
cut-back
| 0.107 |
0.773 | 476.230011 |
Polymer
| 2.55 |
PECVD
|
Wet Etch
| 0.67 |
900C_3hr
| 1,588.699951 |
TE
| 9.83 | 75.690002 | 182.679993 | 27.25 | 5.251 | 1.504 | 82.440002 | 55.389999 | 0.075 | 1.997 | 0.709 |
BATCH_8
|
Measurement
|
ring_resonance
| 0.078 |
1.059 | 539.659973 |
Air
| 2.86 |
PECVD
|
ICP
| 0.5 |
1000C_1hr
| 1,584.839966 |
TE
| -2.69 | 37.41 | 72.849998 | 33.029999 | 4.975 | 1.154 | 87.309998 | 58.75 | 0.17 | 1.852 | 0.882 |
BATCH_37
|
Measurement
|
OTDR
| 0.098 |
1.436 | 244.029999 |
Polymer
| 4.36 |
Sputtering
|
ICP
| 0.95 |
No_Anneal
| 1,508.01001 |
TM
| -9.78 | 32.810001 | 40.119999 | 31.98 | 9.908 | 2.789 | 84.169998 | 48.169998 | 0.268 | 1.594 | 0.946 |
BATCH_38
|
Synthetic
|
ring_resonance
| 0.152 |
1.625 | 495.279999 |
Air
| 3.74 |
LPCVD
|
Wet Etch
| 3.93 |
900C_1hr
| 1,573.109985 |
TM
| -9.71 | 49.490002 | 197.710007 | 43 | 14.503 | 2.947 | 41.23 | 68.089996 | 0.229 | 1.627 | 0.706 |
BATCH_27
|
Synthetic
|
microring_Q
| 0.09 |
1.071 | 554.27002 |
Air
| 2.78 |
LPCVD
|
Wet Etch
| 2.26 |
No_Anneal
| 1,511.209961 |
TM
| 8.57 | 27.370001 | 79.959999 | 30.690001 | 6.917 | 2.084 | 40.18 | 70.059998 | 0.349 | 1.572 | 0.94 |
BATCH_14
|
Measurement
|
ring_resonance
| 0.156 |
0.778 | 373.420013 |
Air
| 3.84 |
PECVD
|
Wet Etch
| 3.32 |
900C_3hr
| 1,575.459961 |
TM
| 6.58 | 73.900002 | 80.730003 | 49.82 | 19.83 | 3.703 | 76.160004 | 64.550003 | 0.048 | 1.954 | 0.851 |
BATCH_15
|
Measurement
|
microring_Q
| 0.035 |
0.515 | 509.51001 |
Polymer
| 2.8 |
Sputtering
|
ICP
| 2.25 |
1000C_1hr
| 1,526.01001 |
TE
| 0.36 | 62.200001 | 32.619999 | 21.65 | 10.999 | 4.27 | 42.880001 | 89.510002 | 0.09 | 1.93 | 0.919 |
BATCH_31
|
Synthetic
|
cut-back
| 0.186 |
1.855 | 443.339996 |
SiO2
| 1.98 |
Sputtering
|
Wet Etch
| 4.42 |
1000C_1hr
| 1,553.290039 |
TE
| -3.63 | 70.290001 | 141.320007 | 35.459999 | 12.097 | 3.09 | 44.919998 | 66.050003 | 0.27 | 1.901 | 0.791 |
BATCH_11
|
Synthetic
|
OTDR
| 0.032 |
1.414 | 369.730011 |
Polymer
| 3.87 |
LPCVD
|
RIE
| 4.67 |
1000C_1hr
| 1,519.890015 |
TM
| 6.76 | 51.830002 | 73.239998 | 20.01 | 3.962 | 1.63 | 50.889999 | 60.919998 | 0.381 | 1.895 | 0.918 |
BATCH_8
|
Synthetic
|
ring_resonance
| 0.087 |
0.632 | 282.730011 |
Air
| 3.3 |
LPCVD
|
Wet Etch
| 2.28 |
1000C_1hr
| 1,505.25 |
TE
| -1.03 | 32.880001 | 192.110001 | 39 | 5.966 | 1.189 | 44.619999 | 60.73 | 0.32 | 1.624 | 0.836 |
BATCH_48
|
Synthetic
|
microring_Q
| 0.156 |
1.112 | 438.359985 |
Air
| 1.26 |
LPCVD
|
RIE
| 0.87 |
900C_1hr
| 1,564.880005 |
TM
| -6.84 | 61.810001 | 70.629997 | 26.83 | 3.271 | 0.805 | 78.82 | 69.139999 | 0.343 | 1.797 | 0.863 |
BATCH_6
|
Measurement
|
ring_resonance
| 0.124 |
1.048 | 454.170013 |
Air
| 2.59 |
Sputtering
|
RIE
| 1.49 |
900C_3hr
| 1,581.52002 |
TE
| 4.5 | 28.110001 | 163.729996 | 28.709999 | 11.374 | 3.413 | 62.599998 | 73.279999 | 0.169 | 1.976 | 0.835 |
BATCH_35
|
Synthetic
|
microring_Q
| 0.086 |
1.337 | 291.679993 |
SiO2
| 2.96 |
Sputtering
|
ICP
| 0.67 |
900C_1hr
| 1,582.449951 |
TE
| -6.39 | 27.4 | 35.029999 | 23.969999 | 13.07 | 4.939 | 87.080002 | 54.889999 | 0.334 | 1.829 | 0.711 |
BATCH_39
|
Synthetic
|
cut-back
| 0.17 |
0.534 | 569.690002 |
Polymer
| 4.61 |
PECVD
|
ICP
| 0.9 |
900C_1hr
| 1,500.050049 |
TE
| 8.61 | 48.91 | 196.419998 | 45.02 | 11.653 | 2.474 | 78.839996 | 64.080002 | 0.407 | 1.676 | 0.904 |
BATCH_8
|
Measurement
|
OTDR
| 0.06 |
0.801 | 534.140015 |
Polymer
| 1.03 |
PECVD
|
RIE
| 4.87 |
No_Anneal
| 1,500.51001 |
TM
| -0.2 | 49.709999 | 22.77 | 19.549999 | 3.955 | 1.353 | 88.040001 | 44.799999 | 0.435 | 1.591 | 0.72 |
BATCH_4
|
Measurement
|
microring_Q
| 0.048 |
0.97 | 556.650024 |
Polymer
| 1.11 |
PECVD
|
ICP
| 4.88 |
900C_3hr
| 1,560.089966 |
TE
| -1.19 | 63.369999 | 117.650002 | 49.740002 | 10.218 | 1.901 | 82.410004 | 49.549999 | 0.284 | 1.863 | 0.948 |
BATCH_31
|
Measurement
|
microring_Q
| 0.161 |
1.865 | 213.449997 |
SiO2
| 4.88 |
Sputtering
|
ICP
| 3.08 |
900C_1hr
| 1,528.109985 |
TE
| -5.34 | 47.84 | 184.460007 | 19.99 | 3.145 | 0.669 | 83.190002 | 48.580002 | 0.389 | 1.939 | 0.878 |
BATCH_5
|
Measurement
|
microring_Q
| 0.116 |
1.288 | 391.109985 |
SiO2
| 1.04 |
PECVD
|
ICP
| 3.98 |
1000C_1hr
| 1,565.23999 |
TE
| 9.63 | 39.639999 | 49.169998 | 13.38 | 2.931 | 1.679 | 54.400002 | 53.970001 | 0.266 | 1.632 | 0.741 |
BATCH_43
|
Synthetic
|
ring_resonance
| 0.167 |
0.931 | 328.959991 |
Air
| 4.38 |
PECVD
|
ICP
| 3.85 |
No_Anneal
| 1,505.619995 |
TE
| -9.95 | 20.450001 | 140.490005 | 2.91 | 2.423 | 2.181 | 70.650002 | 83.879997 | 0.214 | 1.918 | 0.935 |
BATCH_48
|
Measurement
|
ring_resonance
| 0.168 |
0.874 | 279.179993 |
Polymer
| 1.29 |
LPCVD
|
RIE
| 1.58 |
No_Anneal
| 1,546.27002 |
TM
| 4.08 | 21.41 | 78.730003 | 5.09 | 2.041 | 0.611 | 53.32 | 61.529999 | 0.065 | 1.803 | 0.884 |
BATCH_26
|
Measurement
|
OTDR
| 0.176 |
1.441 | 554.52002 |
Polymer
| 4.8 |
PECVD
|
RIE
| 4.64 |
1000C_1hr
| 1,510 |
TM
| 0.54 | 29.889999 | 96.480003 | 36.77 | 13.668 | 3.215 | 73.519997 | 48.959999 | 0.401 | 1.775 | 0.848 |
BATCH_23
|
Measurement
|
microring_Q
| 0.188 |
1.59 | 561.26001 |
Polymer
| 3.9 |
Sputtering
|
Wet Etch
| 4.45 |
No_Anneal
| 1,550.900024 |
TE
| 9.5 | 40.52 | 136.199997 | 33.400002 | 12.852 | 3.633 | 44.650002 | 52.639999 | 0.207 | 1.659 | 0.837 |
BATCH_32
|
Measurement
|
microring_Q
| 0.047 |
1.268 | 463.920013 |
SiO2
| 3.07 |
Sputtering
|
ICP
| 2.36 |
900C_1hr
| 1,516.329956 |
TE
| 1.84 | 74.839996 | 75.370003 | 33.669998 | 3.91 | 0.868 | 88.089996 | 66.440002 | 0.428 | 1.891 | 0.797 |
BATCH_38
|
Measurement
|
microring_Q
| 0.179 |
1.452 | 475.149994 |
SiO2
| 2.98 |
Sputtering
|
ICP
| 2.44 |
No_Anneal
| 1,561.98999 |
TM
| 3.63 | 21.870001 | 72.580002 | 31.08 | 7.114 | 2.081 | 66.129997 | 40.669998 | 0.081 | 1.717 | 0.861 |
BATCH_47
|
Synthetic
|
ring_resonance
| 0.175 |
1.287 | 224.190002 |
Polymer
| 2.09 |
PECVD
|
RIE
| 1.16 |
No_Anneal
| 1,501.459961 |
TE
| -7.71 | 70.82 | 75.190002 | 31.08 | 8.341 | 2.132 | 73.089996 | 70.269997 | 0.444 | 1.874 | 0.945 |
BATCH_7
|
Measurement
|
cut-back
| 0.06 |
0.631 | 475.859985 |
Air
| 1.12 |
Sputtering
|
ICP
| 2.95 |
No_Anneal
| 1,575.290039 |
TE
| 9.17 | 71.459999 | 65.360001 | 7.76 | 3.424 | 2.498 | 75.669998 | 68.199997 | 0.357 | 1.928 | 0.872 |
BATCH_27
|
Measurement
|
cut-back
| 0.157 |
0.764 | 360.149994 |
Polymer
| 4.45 |
Sputtering
|
Wet Etch
| 2.71 |
No_Anneal
| 1,575.329956 |
TE
| 7.18 | 35.07 | 89.849998 | 15.65 | 1.244 | 0.227 | 49.68 | 66.010002 | 0.019 | 1.628 | 0.723 |
BATCH_11
|
Synthetic
|
ring_resonance
| 0.09 |
0.874 | 222.220001 |
SiO2
| 2.5 |
LPCVD
|
RIE
| 3.19 |
900C_3hr
| 1,566.869995 |
TE
| 1.39 | 59.119999 | 172.889999 | 16.809999 | 4.711 | 2.375 | 81.379997 | 65.860001 | 0.424 | 1.933 | 0.837 |
BATCH_33
|
Synthetic
|
cut-back
| 0.092 |
1.386 | 349.619995 |
Polymer
| 2.33 |
PECVD
|
Wet Etch
| 2.01 |
900C_1hr
| 1,586.76001 |
TE
| -3.32 | 26.15 | 82.309998 | 38.02 | 15.801 | 3.776 | 55.099998 | 89.300003 | 0.186 | 1.504 | 0.744 |
BATCH_46
|
Synthetic
|
OTDR
| 0.157 |
1.994 | 403.25 |
Polymer
| 3.15 |
LPCVD
|
ICP
| 3.76 |
1000C_1hr
| 1,591.589966 |
TM
| 5.34 | 53.630001 | 131.589996 | 45.25 | 16.965 | 3.56 | 60.459999 | 80.949997 | 0.211 | 1.965 | 0.747 |
BATCH_10
|
Measurement
|
OTDR
| 0.15 |
1.738 | 557.619995 |
Polymer
| 2.59 |
Sputtering
|
Wet Etch
| 1.57 |
900C_1hr
| 1,557.660034 |
TM
| -0.9 | 32.639999 | 134.800003 | 43.91 | 7.849 | 1.346 | 66.129997 | 57.029999 | 0.419 | 1.58 | 0.882 |
BATCH_20
|
Measurement
|
ring_resonance
| 0.152 |
1.715 | 526.210022 |
Air
| 4.72 |
LPCVD
|
ICP
| 0.52 |
1000C_1hr
| 1,561.290039 |
TE
| -3.15 | 79.82 | 197.149994 | 46.68 | 6.781 | 1.152 | 72.690002 | 75.529999 | 0.324 | 1.885 | 0.888 |
BATCH_28
|
Measurement
|
cut-back
| 0.156 |
1.744 | 263.700012 |
SiO2
| 1.66 |
Sputtering
|
RIE
| 1.95 |
No_Anneal
| 1,594.329956 |
TM
| 2.55 | 37.509998 | 20.73 | 25.34 | 8.85 | 2.81 | 79.730003 | 54.209999 | 0.357 | 1.571 | 0.941 |
BATCH_23
|
Synthetic
|
microring_Q
| 0.105 |
1.919 | 512.320007 |
SiO2
| 4.68 |
PECVD
|
RIE
| 2.41 |
1000C_1hr
| 1,561.47998 |
TM
| 1.05 | 77.099998 | 33.959999 | 9.92 | 5.013 | 4.241 | 62.77 | 74.389999 | 0.15 | 1.724 | 0.907 |
BATCH_44
|
Synthetic
|
OTDR
| 0.186 |
0.94 | 347.040009 |
SiO2
| 4.05 |
Sputtering
|
ICP
| 1.27 |
1000C_1hr
| 1,590.969971 |
TM
| 9.97 | 43.5 | 112.029999 | 45.490002 | 18.183001 | 3.598 | 43.099998 | 76.32 | 0.241 | 1.732 | 0.79 |
BATCH_20
|
Measurement
|
microring_Q
| 0.107 |
1.592 | 374.559998 |
Polymer
| 4.79 |
LPCVD
|
ICP
| 4.65 |
1000C_1hr
| 1,578.819946 |
TE
| 9.97 | 37.860001 | 187.350006 | 17.65 | 4.423 | 1.459 | 53.189999 | 45.59 | 0.298 | 1.536 | 0.899 |
BATCH_37
|
Measurement
|
ring_resonance
| 0.034 |
1.768 | 498.549988 |
SiO2
| 1.86 |
PECVD
|
Wet Etch
| 2.93 |
No_Anneal
| 1,592.75 |
TE
| -1.98 | 22.24 | 172.479996 | 22.450001 | 4.906 | 1.341 | 67.529999 | 81.860001 | 0.188 | 1.68 | 0.871 |
BATCH_25
|
Synthetic
|
OTDR
| 0.113 |
1.456 | 245.309998 |
Air
| 1.62 |
LPCVD
|
ICP
| 2.64 |
1000C_1hr
| 1,516.369995 |
TM
| 8.28 | 36 | 143.449997 | 46.93 | 4.231 | 0.701 | 53.779999 | 83.349998 | 0.476 | 1.674 | 0.76 |
BATCH_23
|
Synthetic
|
cut-back
| 0.13 |
1.695 | 466.829987 |
Air
| 3.39 |
Sputtering
|
RIE
| 3.66 |
1000C_1hr
| 1,539.599976 |
TM
| 2.17 | 59.490002 | 116.5 | 38.27 | 14.577 | 3.481 | 69.620003 | 80.459999 | 0.192 | 1.726 | 0.756 |
BATCH_9
|
Measurement
|
cut-back
| 0.164 |
0.688 | 508.130005 |
SiO2
| 3.68 |
PECVD
|
RIE
| 4.46 |
900C_1hr
| 1,547.060059 |
TE
| 7.46 | 30.43 | 79.959999 | 29.889999 | 9.734 | 2.659 | 70.150002 | 73.230003 | 0.107 | 1.922 | 0.915 |
BATCH_43
|
Measurement
|
microring_Q
| 0.122 |
1.331 | 303.790009 |
Air
| 3.65 |
PECVD
|
RIE
| 2.52 |
900C_3hr
| 1,535.459961 |
TM
| -2.47 | 54.220001 | 172.009995 | 6.42 | 2.325 | 2.72 | 79.040001 | 73.269997 | 0.218 | 1.884 | 0.925 |
BATCH_19
|
Synthetic
|
OTDR
| 0.012 |
1.097 | 512.76001 |
Air
| 3.17 |
PECVD
|
RIE
| 3.17 |
No_Anneal
| 1,538.119995 |
TM
| 0.43 | 46.720001 | 114.82 | 20.879999 | 3.097 | 0.741 | 72.239998 | 43.689999 | 0.155 | 1.814 | 0.805 |
BATCH_1
|
Synthetic
|
cut-back
| 0.086 |
0.559 | 567.26001 |
Polymer
| 4.77 |
PECVD
|
Wet Etch
| 3.54 |
900C_1hr
| 1,514.97998 |
TE
| -9.35 | 40.490002 | 162.789993 | 27.280001 | 5.415 | 1.78 | 59.720001 | 67.779999 | 0.46 | 1.655 | 0.866 |
BATCH_44
|
Measurement
|
microring_Q
| 0.123 |
0.646 | 469.880005 |
SiO2
| 3.75 |
LPCVD
|
RIE
| 0.55 |
900C_3hr
| 1,596.310059 |
TM
| -4.91 | 21.77 | 68.099998 | 7.77 | 2.057 | 1.576 | 56.259998 | 51.02 | 0.241 | 1.561 | 0.833 |
BATCH_21
|
Measurement
|
OTDR
| 0.086 |
1.169 | 325.190002 |
Air
| 4.33 |
Sputtering
|
ICP
| 4.76 |
No_Anneal
| 1,587.52002 |
TE
| -6.17 | 59.830002 | 196.009995 | 45.189999 | 14.811 | 3.157 | 52.900002 | 85.980003 | 0.452 | 1.794 | 0.758 |
BATCH_25
|
Synthetic
|
OTDR
| 0.181 |
0.916 | 566.080017 |
SiO2
| 4.31 |
LPCVD
|
RIE
| 4.78 |
1000C_1hr
| 1,522.219971 |
TE
| -6.45 | 43.099998 | 37.139999 | 49.16 | 16.556 | 2.982 | 44.16 | 79.800003 | 0.407 | 1.514 | 0.868 |
BATCH_41
|
Measurement
|
ring_resonance
| 0.026 |
1.758 | 469.779999 |
Polymer
| 4.47 |
PECVD
|
Wet Etch
| 3.72 |
900C_1hr
| 1,503.060059 |
TE
| -0.2 | 61.25 | 179 | 46.669998 | 12.703 | 2.526 | 85.419998 | 50.599998 | 0.344 | 1.625 | 0.817 |
BATCH_32
|
Measurement
|
OTDR
| 0.061 |
1.384 | 589.72998 |
Polymer
| 1.54 |
PECVD
|
Wet Etch
| 0.91 |
900C_1hr
| 1,524.069946 |
TM
| 3.47 | 44.439999 | 62.25 | 36.619999 | 15.182 | 3.73 | 63.130001 | 50.98 | 0.03 | 1.75 | 0.854 |
BATCH_44
|
Measurement
|
OTDR
| 0.125 |
1.511 | 470.429993 |
Polymer
| 2.17 |
PECVD
|
Wet Etch
| 0.55 |
900C_1hr
| 1,511.079956 |
TM
| 9.91 | 61.98 | 107.839996 | 6.8 | 3.707 | 4.114 | 85.660004 | 73.580002 | 0.113 | 1.937 | 0.939 |
BATCH_38
|
Synthetic
|
OTDR
| 0.095 |
0.889 | 560.080017 |
Polymer
| 1.29 |
LPCVD
|
Wet Etch
| 2.71 |
900C_3hr
| 1,559.939941 |
TE
| -2.47 | 43.759998 | 136.490005 | 40.060001 | 5.553 | 0.932 | 44.689999 | 71.690002 | 0.222 | 1.881 | 0.909 |
BATCH_41
|
Synthetic
|
cut-back
| 0.13 |
1.312 | 277.570007 |
Air
| 2.25 |
PECVD
|
ICP
| 2.67 |
900C_3hr
| 1,558.109985 |
TM
| -7.28 | 78.239998 | 187.509995 | 14.91 | 2.775 | 1.369 | 85.400002 | 54.650002 | 0.381 | 1.779 | 0.739 |
BATCH_8
|
Synthetic
|
microring_Q
| 0.186 |
1.018 | 278.799988 |
Polymer
| 3.26 |
PECVD
|
Wet Etch
| 0.92 |
No_Anneal
| 1,530.530029 |
TM
| 7.78 | 49.220001 | 37.419998 | 26.01 | 13.823 | 4.564 | 56.369999 | 66.800003 | 0.462 | 1.658 | 0.79 |
BATCH_48
|
Synthetic
|
microring_Q
| 0.172 |
1.221 | 495.799988 |
SiO2
| 1.12 |
PECVD
|
RIE
| 2.97 |
No_Anneal
| 1,563.329956 |
TM
| -6.54 | 54.91 | 21.84 | 11.58 | 1.837 | 0.265 | 40.439999 | 73.480003 | 0.189 | 1.96 | 0.745 |
BATCH_47
|
Synthetic
|
OTDR
| 0.192 |
1.374 | 234.229996 |
Air
| 4.96 |
PECVD
|
ICP
| 2.74 |
1000C_1hr
| 1,584.680054 |
TM
| -3.99 | 61.939999 | 63.330002 | 14.24 | 1.747 | 0.326 | 60.349998 | 68.419998 | 0.042 | 1.706 | 0.816 |
BATCH_24
|
Measurement
|
cut-back
| 0.089 |
1.128 | 384.470001 |
SiO2
| 2.01 |
PECVD
|
RIE
| 3.09 |
900C_1hr
| 1,543.959961 |
TE
| 7.38 | 21.940001 | 73.209999 | 49.09 | 21.909 | 4.351 | 53.119999 | 40.07 | 0.389 | 1.897 | 0.891 |
BATCH_13
|
Synthetic
|
OTDR
| 0.098 |
1.191 | 400.859985 |
SiO2
| 4.96 |
Sputtering
|
ICP
| 4.88 |
900C_3hr
| 1,529.420044 |
TE
| -4.29 | 26.67 | 79.169998 | 28.34 | 9.818 | 3.102 | 60.52 | 47.970001 | 0.233 | 1.953 | 0.916 |
BATCH_3
|
Measurement
|
ring_resonance
| 0.132 |
1.319 | 598.98999 |
Air
| 4.53 |
Sputtering
|
Wet Etch
| 4.68 |
900C_3hr
| 1,596.530029 |
TE
| -2.18 | 61.490002 | 134.740005 | 25.120001 | 10.476 | 3.716 | 82.25 | 82.220001 | 0.267 | 1.872 | 0.868 |
BATCH_4
|
Synthetic
|
cut-back
| 0.014 |
1.929 | 328.700012 |
Polymer
| 2.6 |
LPCVD
|
RIE
| 1.54 |
1000C_1hr
| 1,510.719971 |
TE
| -0.36 | 36.779999 | 146.009995 | 42.880001 | 9.239 | 1.875 | 85.010002 | 65.279999 | 0.316 | 1.728 | 0.897 |
BATCH_49
|
Synthetic
|
ring_resonance
| 0.118 |
1.857 | 438.290009 |
SiO2
| 2.05 |
LPCVD
|
RIE
| 3.24 |
900C_3hr
| 1,540.640015 |
TE
| -7.09 | 41.330002 | 24.91 | 30.93 | 13.795 | 4.249 | 84.620003 | 64.269997 | 0.074 | 1.602 | 0.829 |
BATCH_9
|
Synthetic
|
ring_resonance
| 0.06 |
1.199 | 367.929993 |
Air
| 2.77 |
LPCVD
|
RIE
| 3.72 |
900C_1hr
| 1,584.900024 |
TM
| 6.88 | 54.68 | 130.679993 | 31.58 | 14.801 | 4.207 | 75.260002 | 42.990002 | 0.36 | 1.553 | 0.889 |
BATCH_26
|
Synthetic
|
microring_Q
| 0.034 |
1.602 | 392.839996 |
Air
| 4.59 |
Sputtering
|
RIE
| 3.49 |
1000C_1hr
| 1,522.199951 |
TE
| 7.43 | 30.209999 | 164.479996 | 27.530001 | 5.878 | 1.687 | 41.459999 | 47.330002 | 0.019 | 1.619 | 0.799 |
BATCH_35
|
Synthetic
|
ring_resonance
| 0.196 |
1.231 | 373.179993 |
Air
| 3.51 |
Sputtering
|
RIE
| 2.56 |
900C_3hr
| 1,567.180054 |
TM
| -7.6 | 73.230003 | 93.300003 | 4.46 | 2.239 | 0.895 | 55.630001 | 74.699997 | 0.155 | 1.578 | 0.895 |
BATCH_33
|
Synthetic
|
cut-back
| 0.185 |
1.358 | 254.330002 |
Air
| 4.87 |
PECVD
|
Wet Etch
| 4.44 |
No_Anneal
| 1,544.819946 |
TE
| -3.78 | 53.150002 | 123.589996 | 4.22 | 2.552 | 1.629 | 62.25 | 52.209999 | 0.075 | 1.945 | 0.904 |
BATCH_27
|
Measurement
|
ring_resonance
| 0.071 |
1.248 | 550.909973 |
Polymer
| 1.82 |
Sputtering
|
RIE
| 0.86 |
900C_1hr
| 1,565.180054 |
TM
| 7.57 | 33.580002 | 166.440002 | 23.620001 | 7.153 | 2.331 | 88.900002 | 66.650002 | 0.073 | 1.649 | 0.702 |
BATCH_23
|
Synthetic
|
OTDR
| 0.136 |
1.406 | 593.01001 |
SiO2
| 4.16 |
PECVD
|
ICP
| 1.23 |
1000C_1hr
| 1,593.650024 |
TM
| -2.23 | 59.849998 | 131.580002 | 32.32 | 14.653 | 4.156 | 53.650002 | 81.120003 | 0.205 | 1.669 | 0.728 |
BATCH_18
|
Measurement
|
cut-back
| 0.198 |
1.777 | 411.76001 |
SiO2
| 1.06 |
LPCVD
|
ICP
| 1.73 |
900C_1hr
| 1,539.5 |
TE
| 9.42 | 46.27 | 83.790001 | 24.379999 | 9.057 | 3.167 | 50.650002 | 62.419998 | 0.024 | 1.979 | 0.714 |
BATCH_36
|
Synthetic
|
ring_resonance
| 0.035 |
1.933 | 585.690002 |
Air
| 1.69 |
PECVD
|
ICP
| 4.55 |
900C_1hr
| 1,593.560059 |
TE
| 7.76 | 69.900002 | 107.790001 | 19.83 | 1.874 | 0.55 | 57.400002 | 81.769997 | 0.24 | 1.513 | 0.87 |
BATCH_11
|
Measurement
|
ring_resonance
| 0.12 |
0.924 | 316.320007 |
SiO2
| 3.36 |
PECVD
|
Wet Etch
| 3.23 |
900C_1hr
| 1,518.170044 |
TM
| -6.83 | 61 | 88.919998 | 29.120001 | 10.486 | 3.31 | 48.560001 | 87.720001 | 0.035 | 1.907 | 0.891 |
BATCH_3
|
Synthetic
|
microring_Q
| 0.053 |
1.107 | 452.880005 |
SiO2
| 4.99 |
Sputtering
|
Wet Etch
| 1.18 |
1000C_1hr
| 1,531.130005 |
TM
| -2.56 | 52.709999 | 31.23 | 21.879999 | 9.084 | 3.653 | 75.889999 | 57.279999 | 0.142 | 1.881 | 0.928 |
BATCH_10
|
Measurement
|
cut-back
| 0.159 |
1.685 | 464.429993 |
Polymer
| 2.73 |
LPCVD
|
Wet Etch
| 4.81 |
1000C_1hr
| 1,578.589966 |
TM
| 9.62 | 43.18 | 32.939999 | 16.459999 | 2.942 | 0.776 | 42.84 | 49.16 | 0.045 | 1.996 | 0.859 |
BATCH_39
|
Measurement
|
OTDR
| 0.013 |
1.654 | 318.410004 |
Polymer
| 3.99 |
Sputtering
|
RIE
| 3.41 |
900C_1hr
| 1,503.47998 |
TM
| -0.6 | 34.189999 | 52.389999 | 2.9 | 2 | 4.691 | 66.230003 | 60.82 | 0.059 | 1.986 | 0.913 |
BATCH_4
|
Synthetic
|
microring_Q
| 0.143 |
1.767 | 281.359985 |
Air
| 2.18 |
Sputtering
|
Wet Etch
| 3.94 |
900C_3hr
| 1,508.530029 |
TM
| -9.79 | 77.209999 | 80.589996 | 35.91 | 18.226999 | 4.894 | 78.290001 | 68.769997 | 0.028 | 1.755 | 0.7 |
BATCH_9
|
Measurement
|
microring_Q
| 0.134 |
1.648 | 342.98999 |
Air
| 1.79 |
PECVD
|
RIE
| 4.29 |
900C_1hr
| 1,502.910034 |
TE
| -5.88 | 24.129999 | 128.649994 | 2.33 | 2.17 | 2.789 | 89.190002 | 78.800003 | 0.468 | 1.668 | 0.84 |
BATCH_45
|
Synthetic
|
OTDR
| 0.138 |
1.906 | 548.830017 |
Air
| 4.83 |
LPCVD
|
Wet Etch
| 0.59 |
900C_3hr
| 1,565.219971 |
TE
| 8.94 | 31.879999 | 198.929993 | 37.23 | 7.326 | 1.726 | 50.580002 | 88.089996 | 0.401 | 1.709 | 0.779 |
BATCH_1
|
Synthetic
|
ring_resonance
| 0.153 |
1.971 | 346.089996 |
Polymer
| 4.51 |
Sputtering
|
Wet Etch
| 0.55 |
900C_3hr
| 1,577.599976 |
TE
| 3.3 | 29.85 | 35.110001 | 4.29 | 3.877 | 4.845 | 80.059998 | 55.5 | 0.169 | 1.922 | 0.9 |
BATCH_32
|
Synthetic
|
OTDR
| 0.131 |
0.789 | 222.479996 |
SiO2
| 4.04 |
Sputtering
|
ICP
| 1.05 |
900C_3hr
| 1,578.060059 |
TE
| -8.79 | 20.809999 | 26.48 | 40.66 | 3.745 | 0.647 | 43.720001 | 52.400002 | 0.294 | 1.904 | 0.936 |
BATCH_7
|
Synthetic
|
ring_resonance
| 0.156 |
1.439 | 367.179993 |
SiO2
| 1.98 |
PECVD
|
Wet Etch
| 3.57 |
900C_3hr
| 1,527.099976 |
TE
| 2.16 | 54.889999 | 146.029999 | 47.41 | 6.437 | 1.032 | 64.870003 | 46.91 | 0.379 | 1.531 | 0.817 |
BATCH_48
|
Synthetic
|
microring_Q
| 0.199 |
1.989 | 491.920013 |
Air
| 4.25 |
Sputtering
|
RIE
| 2.61 |
900C_1hr
| 1,598.459961 |
TE
| 2.09 | 43.869999 | 184.520004 | 18.27 | 8.059 | 3.341 | 57.099998 | 84.050003 | 0.105 | 1.63 | 0.82 |
BATCH_24
|
Synthetic
|
ring_resonance
| 0.068 |
1.439 | 409.459991 |
SiO2
| 4.39 |
PECVD
|
ICP
| 2.24 |
900C_1hr
| 1,577.449951 |
TM
| 2.52 | 69.980003 | 172.979996 | 15.26 | 3.741 | 1.945 | 83.650002 | 52.470001 | 0.058 | 1.666 | 0.898 |
BATCH_2
|
Synthetic
|
ring_resonance
| 0.115 |
1.315 | 307.269989 |
SiO2
| 3.79 |
PECVD
|
Wet Etch
| 2.79 |
No_Anneal
| 1,508.170044 |
TE
| -0.62 | 39.27 | 163.389999 | 14.55 | 5.256 | 3.114 | 67.5 | 60.25 | 0.132 | 1.904 | 0.93 |
BATCH_6
|
Measurement
|
ring_resonance
| 0.122 |
1.788 | 270.309998 |
Air
| 2.74 |
LPCVD
|
RIE
| 3.38 |
900C_3hr
| 1,541.26001 |
TM
| -9.1 | 63.799999 | 192.669998 | 22.84 | 3.274 | 0.629 | 47.16 | 50.57 | 0.451 | 1.511 | 0.726 |
BATCH_48
|
Measurement
|
OTDR
| 0.12 |
1.513 | 398.480011 |
SiO2
| 3.83 |
LPCVD
|
RIE
| 0.68 |
900C_1hr
| 1,525.069946 |
TM
| 0.68 | 22.969999 | 24.459999 | 35.82 | 15.125 | 3.731 | 89.389999 | 40.189999 | 0.274 | 1.737 | 0.782 |
BATCH_9
|
Measurement
|
OTDR
| 0.042 |
0.723 | 520.799988 |
Air
| 3.59 |
LPCVD
|
RIE
| 4 |
No_Anneal
| 1,540.109985 |
TM
| 3.02 | 31.219999 | 34.77 | 38.080002 | 3.249 | 0.354 | 53.040001 | 88.290001 | 0.415 | 1.511 | 0.805 |
BATCH_3
|
Synthetic
|
ring_resonance
| 0.135 |
1.206 | 507.019989 |
Polymer
| 4.65 |
LPCVD
|
ICP
| 3.2 |
1000C_1hr
| 1,502.880005 |
TE
| -5.31 | 35.599998 | 22.17 | 34.040001 | 16.757 | 4.393 | 52.400002 | 56.459999 | 0.346 | 1.643 | 0.881 |
BATCH_38
|
Synthetic
|
cut-back
| 0.108 |
0.793 | 511.049988 |
Air
| 2.15 |
PECVD
|
Wet Etch
| 1.28 |
900C_1hr
| 1,511.430054 |
TM
| -7.79 | 20.09 | 60.939999 | 18.790001 | 10.791 | 4.874 | 49.860001 | 54.41 | 0.486 | 1.777 | 0.911 |
BATCH_31
|
Synthetic
|
microring_Q
| 0.05 |
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