Datasets:

Taylor658
/

SiN-photonic-waveguide-loss-efficiency

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train · 90k rows

waveguide_width float32 0.5 2	waveguide_height float32 200 600	cladding_material stringclasses 3 values	cladding_thickness float32 1 5	deposition_method stringclasses 3 values	etch_method stringclasses 3 values	sidewall_roughness float32 0.5 5	annealing_params stringclasses 4 values	wavelength float32 1.5k 1.6k	polarization stringclasses 2 values	input_power float32 -10 10	temperature float32 20 80	bend_radius float32 20 200	device_length float32 1 50	insertion_loss float32 0.53 26.5	propagation_loss float32 0.1 5	coupling_efficiency_input float32 40 90	coupling_efficiency_output float32 40 90	scattering_loss float32 0.01 0.5	effective_index float32 1.5 2	mode_confinement_factor float32 0.7 0.95	batch_id stringclasses 50 values	data_source stringclasses 2 values	measurement_method stringclasses 4 values	uncertainty float32 0.01 0.2
0.995	232.270004	SiO2	4.43	Sputtering	Wet Etch	1.55	1000C_1hr	1,543.119995	TM	-6.01	31.23	90.870003	33.369999	3.901	0.887	75.639999	50.650002	0.068	1.804	0.91	BATCH_29	Synthetic	OTDR	0.139
0.632	268.769989	Polymer	3.22	PECVD	RIE	4.4	No_Anneal	1,500.130005	TE	-7.25	76.379997	185.889999	33.509998	5.759	1.159	73.860001	71.889999	0.267	1.542	0.745	BATCH_20	Measurement	OTDR	0.069
1.606	244.309998	SiO2	3.77	PECVD	ICP	2.81	900C_1hr	1,561.670044	TE	-3.86	25.719999	93.239998	5.82	2.003	0.217	63.959999	42.779999	0.274	1.926	0.738	BATCH_18	Measurement	microring_Q	0.039
1.329	376.859985	Polymer	3.42	PECVD	ICP	0.84	900C_1hr	1,579.75	TM	-3.77	30.41	113.919998	23.41	7.271	2.527	57.439999	71.099998	0.073	1.661	0.885	BATCH_25	Synthetic	ring_resonance	0.081
1.346	500.26001	Polymer	3.19	PECVD	Wet Etch	2.45	No_Anneal	1,513.72998	TE	-5.95	56.939999	21.52	46.66	15.061	2.807	52.43	69.07	0.242	1.596	0.724	BATCH_19	Measurement	microring_Q	0.112
1.843	312.459991	Polymer	2.44	Sputtering	Wet Etch	2.37	1000C_1hr	1,514.900024	TM	-7.66	54.189999	76.690002	11.4	4.975	3.836	69.620003	86.610001	0.412	1.748	0.745	BATCH_18	Measurement	cut-back	0.02
1.239	237.389999	Polymer	2.4	Sputtering	RIE	3.48	900C_1hr	1,520.329956	TE	-5.82	35.759998	51.16	26.35	6.675	2.217	74.519997	63.939999	0.395	1.861	0.796	BATCH_29	Synthetic	cut-back	0.042
1.402	510.140015	SiO2	1.89	LPCVD	RIE	0.79	1000C_1hr	1,507.98999	TE	-5.1	69.010002	128.110001	13.84	6.787	4.465	64.440002	75.050003	0.09	1.849	0.82	BATCH_23	Measurement	ring_resonance	0.064
1.393	369.450012	Air	3.97	LPCVD	Wet Etch	0.91	900C_1hr	1,546.199951	TE	-3.17	35.150002	142.279999	49.34	20.49	3.876	45.610001	69.110001	0.017	1.589	0.766	BATCH_20	Measurement	ring_resonance	0.098
0.975	485.440002	Air	2.26	Sputtering	ICP	1.48	No_Anneal	1,538.660034	TE	-3.85	54.860001	155.809998	25.42	4.028	1.214	41.950001	72.910004	0.294	1.873	0.708	BATCH_19	Measurement	microring_Q	0.081
0.759	370.140015	Air	3.49	PECVD	Wet Etch	3.17	1000C_1hr	1,580.060059	TE	2.36	23.84	94.709999	21.129999	3.708	1.146	88.190002	83.269997	0.387	1.929	0.932	BATCH_34	Measurement	OTDR	0.099
1.219	337.429993	SiO2	3.52	PECVD	Wet Etch	4.41	1000C_1hr	1,584.73999	TM	4.49	39.209999	28.98	32.290001	12.764	3.347	55.619999	43.349998	0.379	1.612	0.92	BATCH_48	Synthetic	ring_resonance	0.16
1.41	418.630005	Polymer	3	LPCVD	ICP	3.96	900C_1hr	1,544.680054	TM	-5.91	56.849998	181.070007	14.96	2.55	0.375	75.519997	71.389999	0.423	1.613	0.722	BATCH_30	Synthetic	cut-back	0.12
1.966	374.380005	SiO2	4.96	PECVD	Wet Etch	2.34	No_Anneal	1,542.819946	TE	-0.65	78.239998	127.389999	28.610001	13.058	3.902	77.709999	63.66	0.228	1.9	0.841	BATCH_35	Measurement	OTDR	0.198
1.894	494.690002	SiO2	4.64	PECVD	Wet Etch	4.8	900C_3hr	1,582.420044	TM	-6.83	56.279999	95.790001	16.690001	3.984	1.201	89.739998	72.059998	0.108	1.589	0.826	BATCH_4	Synthetic	cut-back	0.163
0.903	361.25	SiO2	1.16	LPCVD	ICP	1.56	No_Anneal	1,535.5	TE	2.68	21.040001	111.339996	2.33	2.763	4.471	86.769997	80.150002	0.087	1.782	0.841	BATCH_41	Synthetic	cut-back	0.103
1.726	523.849976	SiO2	4.96	Sputtering	RIE	4.74	1000C_1hr	1,551.689941	TE	-7.52	50.540001	38.73	21.26	2.482	0.341	84.5	62.32	0.291	1.906	0.855	BATCH_34	Measurement	microring_Q	0.102
0.581	498.660004	Polymer	3.19	PECVD	Wet Etch	2.62	1000C_1hr	1,532.189941	TM	9.95	56.060001	146.179993	46.810001	17.433001	3.457	62.560001	66.709999	0.148	1.88	0.809	BATCH_46	Measurement	cut-back	0.031
1.623	403.75	Air	2.38	LPCVD	Wet Etch	1.98	900C_3hr	1,507.619995	TE	5.99	46.650002	136.25	34.459999	15.643	4.222	48.279999	69.470001	0.135	1.549	0.864	BATCH_39	Synthetic	ring_resonance	0.199
0.54	284.720001	SiO2	1.01	LPCVD	Wet Etch	4.08	1000C_1hr	1,588.310059	TE	8.34	21.860001	42.57	5.54	3.858	4.998	54.07	78.199997	0.261	1.784	0.829	BATCH_8	Synthetic	cut-back	0.088
1.342	310.940002	Air	2.65	PECVD	ICP	2.26	900C_1hr	1,544.469971	TE	-8.4	58.23	99.629997	38.34	18.267	4.315	80.949997	55.32	0.219	1.513	0.905	BATCH_35	Measurement	ring_resonance	0.09
1.702	481.640015	Air	4.09	LPCVD	ICP	2.52	900C_3hr	1,551.819946	TE	-9.5	45.91	118.940002	40.540001	3.077	0.558	75.449997	43.41	0.473	1.989	0.941	BATCH_21	Measurement	ring_resonance	0.048
1.575	577.25	SiO2	1.12	PECVD	RIE	2.65	No_Anneal	1,595.319946	TM	-7.89	30.969999	54.529999	41.290001	21.125999	4.853	68.949997	85.07	0.324	1.564	0.906	BATCH_37	Measurement	microring_Q	0.086
0.958	545.849976	SiO2	1.48	Sputtering	Wet Etch	0.84	No_Anneal	1,564.209961	TM	5.72	79.470001	97.480003	17.959999	9.209	4.08	65.580002	69.32	0.096	1.818	0.745	BATCH_30	Synthetic	cut-back	0.076
1.633	471.690002	Air	2.78	LPCVD	ICP	3.39	No_Anneal	1,574.01001	TE	-1.52	39.810001	135.580002	17.309999	8.626	4.018	45.369999	79.599998	0.401	1.707	0.797	BATCH_29	Measurement	microring_Q	0.141
1.511	222.220001	Air	1.39	Sputtering	Wet Etch	3.29	1000C_1hr	1,588.369995	TM	1.8	67.599998	49.709999	8.17	4.477	4.475	41.290001	77.93	0.479	1.832	0.764	BATCH_25	Synthetic	OTDR	0.029
1.578	293.619995	SiO2	2.63	LPCVD	RIE	4.14	No_Anneal	1,552.329956	TE	5.24	36.209999	163.259995	44.369999	10.209	2.104	62.689999	55.810001	0.208	1.896	0.772	BATCH_16	Measurement	ring_resonance	0.142
1.745	255.570007	SiO2	2.33	LPCVD	ICP	0.5	No_Anneal	1,570.22998	TE	-3.16	33.25	63.299999	41.919998	15.8	3.39	40.52	73.839996	0.256	1.896	0.818	BATCH_35	Measurement	cut-back	0.04
0.619	573.51001	Air	1.45	LPCVD	RIE	4.8	No_Anneal	1,512.040039	TM	-7.33	76.019997	61.810001	21.93	8.806	3.494	69.779999	60	0.334	1.954	0.82	BATCH_32	Synthetic	microring_Q	0.075
1.475	394.799988	Polymer	2.15	LPCVD	Wet Etch	3.14	900C_3hr	1,548.329956	TE	0.89	60.330002	165.059998	17.98	6.577	2.819	51.669998	44.68	0.201	1.825	0.899	BATCH_31	Measurement	cut-back	0.112
1.195	415.140015	SiO2	3.31	PECVD	RIE	2.38	No_Anneal	1,529.209961	TM	-8.58	53.900002	155.589996	37.43	3.814	0.49	45.060001	66.540001	0.266	1.766	0.909	BATCH_44	Synthetic	cut-back	0.195
1.484	344.829987	SiO2	2.73	LPCVD	Wet Etch	0.93	900C_3hr	1,523.880005	TM	-3.52	51.75	195.240005	49.650002	11.535	1.987	63.349998	77.57	0.126	1.727	0.831	BATCH_19	Synthetic	microring_Q	0.108
1.005	295.079987	SiO2	2.57	LPCVD	Wet Etch	1.21	900C_3hr	1,522.599976	TE	7.36	30.799999	91.230003	27.190001	11.769	4.038	84.599998	62.900002	0.097	1.572	0.715	BATCH_43	Synthetic	microring_Q	0.114
1.736	201.589996	Polymer	2.86	Sputtering	Wet Etch	4.37	900C_3hr	1,504.660034	TM	9.75	31.940001	194.580002	46.400002	20.875	4.098	87.800003	57.630001	0.234	1.598	0.928	BATCH_37	Measurement	ring_resonance	0.03
0.595	211.009995	Air	2.69	PECVD	ICP	4.57	900C_1hr	1,500.369995	TM	-5.8	78.209999	138.820007	26.65	7.98	2.732	45.73	73.540001	0.151	1.532	0.725	BATCH_39	Measurement	microring_Q	0.124
0.734	590.609985	SiO2	4.88	PECVD	Wet Etch	3.63	900C_3hr	1,529	TM	-0.55	71.82	65.139999	31.49	16.971001	4.829	61.990002	40.720001	0.314	1.585	0.921	BATCH_27	Measurement	ring_resonance	0.163
0.829	275.440002	SiO2	4.61	LPCVD	Wet Etch	2.58	1000C_1hr	1,552.119995	TM	-0.62	33.080002	130.5	13.49	2.287	0.329	76.529999	56.860001	0.486	1.735	0.938	BATCH_45	Measurement	microring_Q	0.023
1.175	205.029999	Air	1.64	Sputtering	RIE	3.71	900C_1hr	1,541.719971	TM	1.25	74.400002	102.989998	48.630001	23.974001	4.756	75.169998	56.200001	0.318	1.818	0.829	BATCH_48	Synthetic	cut-back	0.192
0.865	245.979996	Air	3.87	LPCVD	RIE	4.94	900C_3hr	1,550.880005	TM	-9.45	76.18	119.25	14.15	3.6	1.487	58.389999	64.169998	0.477	1.598	0.804	BATCH_11	Measurement	cut-back	0.066
1.185	513.580017	Air	4.28	PECVD	Wet Etch	0.74	1000C_1hr	1,553.660034	TE	7.75	65.510002	194.699997	26.799999	10.243	3.616	73.720001	81.779999	0.105	1.916	0.703	BATCH_43	Measurement	microring_Q	0.02
1.836	280.589996	Air	1.22	LPCVD	ICP	1.49	900C_3hr	1,505.630005	TE	-1.28	55.43	63.720001	48.66	17.629999	3.243	87.019997	57.630001	0.06	1.706	0.719	BATCH_41	Measurement	cut-back	0.012
1.469	221.220001	Polymer	2.98	Sputtering	RIE	0.88	900C_1hr	1,559.680054	TM	5.6	57.029999	177.300003	25.98	11.227	3.873	49.599998	61.939999	0.361	1.996	0.778	BATCH_34	Synthetic	ring_resonance	0.133
1.162	545.97998	Polymer	3.71	PECVD	Wet Etch	3.59	900C_3hr	1,533.369995	TM	2.04	44.02	45.720001	2.18	2.177	3.301	86.959999	44.630001	0.317	1.505	0.837	BATCH_29	Measurement	microring_Q	0.07
0.51	357.950012	SiO2	2.58	PECVD	Wet Etch	2.84	1000C_1hr	1,520.319946	TE	4.35	63.939999	184.850006	33.860001	17.327999	4.86	70.279999	47.290001	0.344	1.869	0.728	BATCH_46	Measurement	cut-back	0.149
1.743	235.889999	SiO2	1.55	LPCVD	RIE	4.25	No_Anneal	1,540.619995	TM	-0.62	40.380001	77.669998	28.41	8.38	2.315	54.18	88.709999	0.451	1.93	0.831	BATCH_36	Measurement	ring_resonance	0.2
1.768	222.070007	Polymer	3.06	LPCVD	Wet Etch	1.97	900C_1hr	1,556.689941	TM	-9.64	23.85	142.610001	2.8	1.614	3.814	42.950001	68.230003	0.091	1.826	0.924	BATCH_26	Synthetic	OTDR	0.137
1.085	227.080002	SiO2	3.26	LPCVD	ICP	2.71	No_Anneal	1,559.030029	TE	-1.06	66.339996	91.660004	32.419998	12.696	3.415	46.23	45.84	0.261	1.617	0.795	BATCH_47	Synthetic	cut-back	0.191
1.351	351.559998	Polymer	3.04	PECVD	RIE	2.39	900C_1hr	1,584.040039	TE	3.51	24.1	109.989998	46.98	22.591	4.49	79.440002	76.919998	0.145	1.655	0.94	BATCH_22	Measurement	ring_resonance	0.059
0.973	394.630005	Polymer	1.1	Sputtering	ICP	3.01	No_Anneal	1,543.910034	TE	6.62	73.410004	38.200001	9.94	5.329	4.734	45	74.639999	0.16	1.813	0.742	BATCH_31	Measurement	OTDR	0.191
0.723	374.779999	SiO2	2.37	PECVD	Wet Etch	4.61	1000C_1hr	1,524.449951	TE	-3.84	22.059999	108.510002	49.439999	16.473	3.083	79.279999	81.870003	0.331	1.903	0.799	BATCH_24	Synthetic	cut-back	0.015
1.871	485.769989	SiO2	1.04	LPCVD	ICP	1.38	900C_3hr	1,585.02002	TM	5.68	26.18	60.459999	18.040001	1.057	0.304	54.5	52.040001	0.096	1.594	0.846	BATCH_20	Synthetic	microring_Q	0.082
0.651	449.459991	Polymer	4.16	LPCVD	ICP	1	900C_3hr	1,550.810059	TM	5.71	20.27	184.080002	41.950001	21.753	4.966	49.57	69.010002	0.167	1.531	0.9	BATCH_17	Measurement	OTDR	0.047
1.216	301.140015	Air	4.92	LPCVD	ICP	0.62	1000C_1hr	1,588.780029	TE	3.8	40.700001	141.919998	17.059999	8.879	4.534	79.160004	69.260002	0.318	1.616	0.766	BATCH_6	Measurement	cut-back	0.023
1.287	585.719971	Air	1.51	LPCVD	RIE	3.51	1000C_1hr	1,521.780029	TE	-0.23	67.150002	125.989998	20.219999	5.86	2.514	61.200001	88.400002	0.046	1.903	0.816	BATCH_38	Synthetic	ring_resonance	0.131
0.933	368.230011	Polymer	2.03	Sputtering	Wet Etch	2.66	900C_3hr	1,512.349976	TM	-4.86	22.42	89.419998	32.41	13.824	4.049	87.489998	77.339996	0.222	1.626	0.903	BATCH_49	Measurement	microring_Q	0.056
0.843	287.630005	SiO2	3.08	Sputtering	RIE	2.76	900C_1hr	1,534.5	TM	-8.39	28.110001	46.639999	38.959999	6.096	1.155	43.139999	89.639999	0.285	1.626	0.89	BATCH_7	Measurement	ring_resonance	0.045
1.737	482.850006	Polymer	3.85	PECVD	ICP	4.56	No_Anneal	1,563.650024	TE	7.2	46.790001	136.089996	35.290001	18.57	4.916	55.02	56.220001	0.146	1.657	0.725	BATCH_11	Synthetic	cut-back	0.192
1.639	201.490005	SiO2	2.67	PECVD	RIE	3.1	900C_1hr	1,515.099976	TE	-3.14	31.280001	38.740002	44.18	13.565	2.891	70.459999	44.740002	0.492	1.732	0.839	BATCH_37	Measurement	cut-back	0.082
1.754	242.710007	Air	2.18	PECVD	RIE	1.96	No_Anneal	1,590.650024	TE	-9.21	76.209999	75.529999	7.45	5.168	4.676	76.059998	72.529999	0.13	1.937	0.768	BATCH_38	Synthetic	cut-back	0.137
0.744	251.830002	SiO2	1.28	Sputtering	RIE	3.56	No_Anneal	1,595.47998	TM	1.08	61.98	53.380001	9.37	5.007	3.333	46.939999	87.150002	0.274	1.535	0.702	BATCH_18	Synthetic	cut-back	0.015
1.214	390.470001	Air	3.7	PECVD	Wet Etch	4.07	No_Anneal	1,506.310059	TE	-4.63	72.650002	64.93	18.07	4.238	1.26	44.240002	51.099998	0.353	1.998	0.743	BATCH_48	Measurement	cut-back	0.011
1.422	378.329987	SiO2	1.82	Sputtering	RIE	0.57	900C_1hr	1,586.48999	TE	2.12	61.459999	120.129997	10.32	6.901	4.926	72.889999	83.75	0.37	1.924	0.8	BATCH_30	Synthetic	OTDR	0.075
0.59	296.549988	Air	4.97	LPCVD	RIE	1.01	1000C_1hr	1,550.109985	TE	3.38	64.980003	93.330002	47.57	13.035	2.54	84.910004	79.709999	0.2	1.88	0.923	BATCH_3	Synthetic	microring_Q	0.177
1.712	502.089996	SiO2	1.15	Sputtering	Wet Etch	2.48	900C_3hr	1,509.300049	TM	3.08	47.380001	83.389999	11.86	7.355	4.896	86.400002	45.290001	0.114	1.968	0.844	BATCH_37	Synthetic	cut-back	0.114
1.585	490.329987	SiO2	4.93	PECVD	ICP	4.32	1000C_1hr	1,532.73999	TM	7.34	67.480003	168.960007	27.99	11.037	3.471	85.139999	68.339996	0.128	1.637	0.891	BATCH_43	Synthetic	OTDR	0.149
0.741	535.900024	Air	4.87	Sputtering	Wet Etch	1	1000C_1hr	1,566.670044	TM	2.57	28.459999	113.089996	23.23	9.416	3.215	51.5	81.860001	0.078	1.523	0.938	BATCH_15	Measurement	OTDR	0.189
0.934	453.459991	Air	4.82	Sputtering	RIE	1.32	900C_1hr	1,514.329956	TM	8.97	33.709999	86.940002	30.16	3.585	0.535	40.32	55.560001	0.364	1.922	0.818	BATCH_13	Synthetic	ring_resonance	0.116
0.959	283.190002	SiO2	1.59	Sputtering	Wet Etch	1.64	900C_3hr	1,580.22998	TE	3.8	56.419998	25.389999	43.02	4.127	0.551	71.339996	69.18	0.329	1.598	0.881	BATCH_15	Measurement	OTDR	0.092
1.764	331.049988	SiO2	4.67	PECVD	ICP	4.58	900C_1hr	1,592.550049	TE	-6.07	54.880001	198.960007	30.280001	14.089	4.24	60.709999	62.639999	0.076	1.866	0.888	BATCH_10	Measurement	microring_Q	0.148
0.941	222.940002	SiO2	4.09	Sputtering	RIE	1.26	900C_3hr	1,546.040039	TM	8.01	26.58	26.280001	29.379999	3.041	0.494	68.589996	71.879997	0.048	1.624	0.708	BATCH_26	Measurement	ring_resonance	0.095
1.431	567.200012	SiO2	1.44	Sputtering	Wet Etch	2.61	900C_1hr	1,506.560059	TM	-3.34	70.480003	98.540001	47.279999	23.93	4.863	88.669998	72.349998	0.323	1.702	0.766	BATCH_25	Synthetic	cut-back	0.161
1.962	474.850006	Polymer	1.51	Sputtering	RIE	4.63	900C_3hr	1,524.030029	TM	-0.47	37.830002	85.129997	33.52	10.516	2.837	89.879997	69.349998	0.208	1.574	0.948	BATCH_4	Measurement	cut-back	0.013
1.244	215.119995	Polymer	2.96	LPCVD	ICP	2.16	No_Anneal	1,559.430054	TE	-3.03	33.009998	43.09	1.86	1.328	2.211	67.150002	42.43	0.461	1.58	0.786	BATCH_50	Synthetic	microring_Q	0.16
0.6	583.530029	Polymer	4.39	LPCVD	RIE	3.23	900C_1hr	1,508.400024	TE	1.35	29.200001	113.459999	31.18	10.079	2.831	88.32	76.040001	0.49	1.614	0.877	BATCH_13	Synthetic	cut-back	0.113
1.029	206.070007	Polymer	2.18	LPCVD	Wet Etch	4.02	900C_1hr	1,527.199951	TE	8.93	44.759998	157.759995	32.93	6.81	1.604	60.630001	52.290001	0.183	1.982	0.764	BATCH_38	Synthetic	cut-back	0.183
1.164	246.720001	Air	2.24	PECVD	Wet Etch	0.76	900C_1hr	1,539.839966	TM	-7.03	26.91	123.82	34.68	11.309	3.102	76.489998	72.809998	0.225	1.61	0.811	BATCH_6	Synthetic	OTDR	0.059
1.34	428.190002	SiO2	4.92	Sputtering	RIE	3.68	900C_1hr	1,544.339966	TM	6.91	52.330002	150.190002	36.27	9.506	2.309	77.110001	89.989998	0.044	1.764	0.859	BATCH_30	Synthetic	OTDR	0.163
1.441	388.019989	SiO2	1.63	LPCVD	Wet Etch	2.01	900C_1hr	1,515.219971	TM	1.24	41.349998	26.26	34.5	17.332001	4.513	57.310001	56.5	0.166	1.961	0.78	BATCH_46	Synthetic	OTDR	0.195
0.793	498.899994	SiO2	4.66	LPCVD	RIE	2.34	900C_3hr	1,541.02002	TE	3.42	25.16	118	23.290001	10.112	4.094	87.300003	74.480003	0.399	1.551	0.927	BATCH_23	Measurement	ring_resonance	0.088
0.839	503.690002	SiO2	4.14	PECVD	Wet Etch	4.44	900C_3hr	1,579.640015	TM	-2.9	77.550003	127.790001	20.17	8.274	3.7	51.02	75.849998	0.37	1.662	0.833	BATCH_26	Measurement	ring_resonance	0.047
1.06	297.730011	Polymer	2.53	Sputtering	RIE	2.62	900C_3hr	1,504.660034	TM	-6.44	24.860001	74.769997	10.18	5.673	4.258	56.110001	47.509998	0.26	1.617	0.91	BATCH_33	Synthetic	OTDR	0.185
0.942	474.630005	Polymer	3.19	PECVD	ICP	4.35	900C_3hr	1,570.51001	TM	6.91	33.169998	77.959999	20.280001	4.792	1.974	46.700001	51.939999	0.464	1.977	0.832	BATCH_11	Measurement	microring_Q	0.028
1.542	538.640015	Air	4.49	PECVD	ICP	2.71	1000C_1hr	1,566.5	TM	1.85	52.169998	37.709999	2.77	2.373	4.857	85.580002	58.860001	0.341	1.801	0.845	BATCH_14	Synthetic	cut-back	0.081
0.634	433.570007	Polymer	4.21	Sputtering	Wet Etch	3.58	900C_3hr	1,534.560059	TE	-6.9	50.689999	115.099998	25.190001	9.514	3.536	50.599998	69.470001	0.13	1.997	0.897	BATCH_26	Measurement	cut-back	0.191
1.374	333.179993	SiO2	2.25	Sputtering	RIE	0.57	900C_1hr	1,580.859985	TM	-4.55	62.900002	67.25	46.5	16.466999	3.144	40.990002	84.050003	0.373	1.896	0.95	BATCH_12	Measurement	cut-back	0.134
1.992	451.309998	Air	4.84	Sputtering	ICP	1.63	No_Anneal	1,517.5	TM	-8.41	70.360001	102.800003	22.030001	3.178	0.751	43.759998	45.16	0.225	1.602	0.845	BATCH_38	Synthetic	cut-back	0.042
1.845	558.950012	Air	4.48	Sputtering	Wet Etch	0.94	1000C_1hr	1,540.839966	TM	5.43	34.849998	198.399994	19.549999	6.611	3.089	42.310001	58.639999	0.254	1.985	0.754	BATCH_23	Synthetic	cut-back	0.172
1.81	480.589996	Air	3.04	LPCVD	Wet Etch	4.39	No_Anneal	1,524.400024	TM	8.86	57.02	44.139999	28.01	1.795	0.376	57.639999	62.41	0.304	1.907	0.736	BATCH_16	Measurement	microring_Q	0.063
1.885	308.179993	Air	3.74	LPCVD	RIE	0.62	900C_1hr	1,597.910034	TM	1.77	74.440002	101.360001	49.290001	5.944	1.048	57.68	47.68	0.171	1.919	0.916	BATCH_18	Synthetic	cut-back	0.158
1.929	563.369995	Polymer	1.81	LPCVD	ICP	1.63	No_Anneal	1,551.380005	TE	-5.96	72.650002	183.389999	28.780001	10.791	3.49	74.620003	44.5	0.011	1.756	0.837	BATCH_11	Synthetic	microring_Q	0.103
1.342	275.209991	SiO2	3.43	Sputtering	Wet Etch	2.68	1000C_1hr	1,556.97998	TE	-6.29	76.870003	188.860001	28.76	3.048	0.495	78.589996	73.410004	0.207	1.762	0.795	BATCH_39	Synthetic	ring_resonance	0.173
0.667	259.459991	Air	3.67	Sputtering	RIE	4.41	No_Anneal	1,562.709961	TM	-3.12	57.25	152.350006	9.51	1.825	0.523	53.720001	44.040001	0.104	1.515	0.714	BATCH_4	Synthetic	microring_Q	0.024
1.845	407.059998	SiO2	4.97	Sputtering	RIE	2.6	1000C_1hr	1,587.209961	TE	3.66	35.439999	139.300003	21.92	2.171	0.66	62.810001	77.980003	0.202	1.79	0.813	BATCH_21	Synthetic	OTDR	0.129
1.708	462.279999	Air	1.11	LPCVD	RIE	1.36	No_Anneal	1,545.420044	TM	-1.6	52.68	153.669998	7.66	2.419	0.8	43.860001	51.73	0.043	1.552	0.764	BATCH_25	Synthetic	ring_resonance	0.021
1.633	521.799988	Polymer	1.35	LPCVD	Wet Etch	3	1000C_1hr	1,526.349976	TE	3.8	44.400002	39.16	48.610001	19.309	3.691	69.639999	54.02	0.152	1.958	0.912	BATCH_24	Measurement	ring_resonance	0.095
1.959	211.339996	Polymer	3.21	PECVD	ICP	2.04	900C_1hr	1,583.880005	TM	9.7	76.949997	20.51	5.68	4.073	4.358	51.279999	82.360001	0.179	1.891	0.782	BATCH_9	Measurement	cut-back	0.078
1.202	396.899994	SiO2	2.69	LPCVD	ICP	2.82	No_Anneal	1,579.810059	TM	-9.21	64.139999	78.879997	5.6	3.108	4.191	41.130001	69.07	0.329	1.686	0.706	BATCH_21	Synthetic	ring_resonance	0.11
1.316	557.210022	SiO2	4.21	LPCVD	Wet Etch	2.96	No_Anneal	1,588.140015	TE	-5.06	54.639999	199.649994	44.02	6.139	1.201	57.18	50.529999	0.303	1.747	0.869	BATCH_50	Measurement	ring_resonance	0.014
0.529	584.76001	Air	3.24	LPCVD	ICP	2.14	900C_3hr	1,594.160034	TM	-5.32	61.130001	131	6.99	1.103	0.705	52.93	60.369999	0.274	1.81	0.727	BATCH_35	Synthetic	OTDR	0.142
1.168	575.690002	Polymer	3.3	PECVD	RIE	4.56	No_Anneal	1,533.050049	TE	-3.38	30.32	151.289993	30.77	2.225	0.22	64.739998	78.739998	0.254	1.805	0.939	BATCH_1	Synthetic	microring_Q	0.159

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