Datasets:

Taylor658
/

SiN-photonic-waveguide-loss-efficiency

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train · 90k rows

waveguide_width float32 0.5 2	waveguide_height float32 200 600	cladding_material stringclasses 3 values	cladding_thickness float32 1 5	deposition_method stringclasses 3 values	etch_method stringclasses 3 values	sidewall_roughness float32 0.5 5	annealing_params stringclasses 4 values	wavelength float32 1.5k 1.6k	polarization stringclasses 2 values	input_power float32 -10 10	temperature float32 20 80	bend_radius float32 20 200	device_length float32 1 50	insertion_loss float32 0.53 26.5	propagation_loss float32 0.1 5	coupling_efficiency_input float32 40 90	coupling_efficiency_output float32 40 90	scattering_loss float32 0.01 0.5	effective_index float32 1.5 2	mode_confinement_factor float32 0.7 0.95	batch_id stringclasses 50 values	data_source stringclasses 2 values	measurement_method stringclasses 4 values	uncertainty float32 0.01 0.2
1.754	469.619995	Air	4.88	LPCVD	RIE	3.11	No_Anneal	1,573.119995	TE	-1.8	75.889999	162.75	15.23	5.103	2.17	51.459999	88.540001	0.373	1.716	0.821	BATCH_34	Measurement	ring_resonance	0.023
1.021	523.859985	Air	1.57	PECVD	ICP	0.79	No_Anneal	1,577.219971	TE	-4.53	45.860001	50.299999	46.27	23.007999	4.806	83.449997	73.639999	0.216	1.682	0.916	BATCH_9	Measurement	OTDR	0.038
1.14	597.700012	SiO2	4.59	PECVD	ICP	2.76	1000C_1hr	1,562.150024	TE	-7.44	36.959999	67.550003	24.42	9.826	3.465	68.059998	79.910004	0.1	1.58	0.767	BATCH_15	Synthetic	cut-back	0.112
1.577	441.149994	Air	1.25	LPCVD	Wet Etch	1.14	900C_3hr	1,500.959961	TM	-6.12	33.599998	69.580002	28.799999	3.054	0.501	46.240002	70.18	0.358	1.893	0.83	BATCH_19	Synthetic	OTDR	0.181
1.162	445.149994	Air	2.19	LPCVD	Wet Etch	3.88	No_Anneal	1,584.790039	TM	-2.77	74.379997	111.970001	47.849998	10.953	2.04	72.190002	71.730003	0.22	1.599	0.882	BATCH_12	Synthetic	cut-back	0.016
0.553	537.309998	Air	4.3	LPCVD	Wet Etch	4.99	No_Anneal	1,543.180054	TE	5.07	41.380001	66.650002	34.91	12.01	3.243	41.200001	89.870003	0.26	1.784	0.818	BATCH_12	Synthetic	ring_resonance	0.063
1.181	216.160004	Polymer	4.68	Sputtering	ICP	4.58	No_Anneal	1,578.050049	TM	0.01	50.84	154.139999	19.129999	11.044	4.955	58.150002	44.869999	0.221	1.753	0.738	BATCH_29	Measurement	microring_Q	0.158
1.178	350.850006	Polymer	2.25	LPCVD	RIE	1.7	1000C_1hr	1,566.400024	TM	-8.6	30.639999	94.410004	49.869999	21.465	3.956	51.900002	81.25	0.338	1.856	0.921	BATCH_36	Measurement	microring_Q	0.086
1.427	446.140015	Polymer	3.63	PECVD	ICP	0.75	1000C_1hr	1,509.920044	TE	-8.75	73.18	72.699997	47.220001	7.417	1.318	79.139999	74.269997	0.259	1.981	0.894	BATCH_16	Measurement	ring_resonance	0.032
0.635	507.929993	SiO2	3.28	Sputtering	RIE	2.71	900C_1hr	1,596.400024	TM	-9.88	56.669998	21.5	44.470001	21.854	4.638	64.580002	60.439999	0.136	1.976	0.789	BATCH_25	Synthetic	microring_Q	0.144
0.692	256.48999	Polymer	3.49	Sputtering	ICP	2.35	No_Anneal	1,565.099976	TM	-8.68	27.17	128.389999	14.89	6.064	3.323	62.25	55.689999	0.461	1.984	0.881	BATCH_41	Synthetic	microring_Q	0.078
1.256	363.76001	Polymer	1.55	PECVD	Wet Etch	1.04	900C_3hr	1,531.140015	TM	7.84	50.970001	41.529999	4.65	2.736	4.157	59.27	46.93	0.249	1.864	0.836	BATCH_44	Measurement	ring_resonance	0.122
1.572	420.940002	SiO2	1.96	PECVD	Wet Etch	4.91	No_Anneal	1,513.140015	TM	9	61.59	152.020004	9.18	4.32	3.225	64.739998	51.73	0.313	1.604	0.904	BATCH_2	Measurement	cut-back	0.126
1.911	325.529999	SiO2	3.28	Sputtering	ICP	2.84	1000C_1hr	1,555.140015	TM	-1.14	64.290001	141.240005	47.330002	14.238	2.59	69.650002	62.810001	0.421	1.625	0.852	BATCH_8	Synthetic	microring_Q	0.129
1.719	421.799988	Polymer	4.48	Sputtering	ICP	2.94	No_Anneal	1,588.76001	TM	4.28	25.809999	154.429993	35.360001	5.588	1.368	46.02	72.860001	0.193	1.716	0.821	BATCH_15	Synthetic	OTDR	0.059
1.755	414.769989	SiO2	3.51	PECVD	ICP	3.53	No_Anneal	1,528.069946	TE	6.19	22.719999	47.200001	43.299999	13.04	2.684	58.720001	82.800003	0.426	1.772	0.708	BATCH_38	Measurement	microring_Q	0.051
1.586	457.690002	SiO2	1.01	LPCVD	RIE	1.25	900C_1hr	1,525.880005	TM	-8.02	29.799999	84.300003	13.78	8.617	4.974	72.639999	83.610001	0.146	1.684	0.827	BATCH_31	Synthetic	cut-back	0.096
0.934	533.700012	SiO2	1.77	LPCVD	ICP	1.89	900C_1hr	1,545.550049	TE	-8.02	42.790001	103.43	6.91	2.379	1.074	53	50.68	0.43	1.819	0.931	BATCH_14	Synthetic	ring_resonance	0.14
0.883	479.75	Polymer	2.82	LPCVD	Wet Etch	4.87	1000C_1hr	1,592.859985	TE	1.43	42.150002	33.299999	36.889999	18.327	4.821	41.07	82.669998	0.446	1.678	0.744	BATCH_31	Synthetic	ring_resonance	0.081
1.281	376.970001	SiO2	1.43	Sputtering	Wet Etch	4.43	1000C_1hr	1,519.359985	TE	-7.79	45.09	121.800003	15.21	8.023	4.028	85.489998	87.540001	0.049	1.765	0.847	BATCH_37	Synthetic	OTDR	0.023
0.832	439.559998	SiO2	2.66	Sputtering	ICP	4.8	1000C_1hr	1,589.630005	TE	6.33	40.82	149.979996	25.26	6.822	2.169	79.830002	62.200001	0.252	1.762	0.867	BATCH_22	Measurement	microring_Q	0.184
1.044	267.73999	Air	2.45	PECVD	Wet Etch	2.66	1000C_1hr	1,559.530029	TE	-9.2	53.380001	40.450001	46.5	4.944	0.677	76.669998	71.470001	0.469	1.953	0.918	BATCH_43	Synthetic	cut-back	0.076
0.655	207.889999	SiO2	4.43	PECVD	RIE	1.03	900C_3hr	1,560.77002	TM	-9.07	76.099998	166.25	38.419998	15.303	3.588	64.849998	41.060001	0.039	1.95	0.721	BATCH_41	Measurement	cut-back	0.075
0.916	572.25	Polymer	1.17	PECVD	Wet Etch	2.66	No_Anneal	1,590.920044	TE	-1.05	68.339996	136.490005	3.26	2.864	4.679	61.720001	71.669998	0.237	1.795	0.705	BATCH_23	Synthetic	cut-back	0.115
1.01	297.23999	Air	2.9	PECVD	RIE	3.11	1000C_1hr	1,517.280029	TE	-7.79	39.369999	62.34	4.94	3.749	4.464	44.700001	50.490002	0.22	1.934	0.927	BATCH_15	Synthetic	ring_resonance	0.031
1.517	373.920013	SiO2	4.89	LPCVD	RIE	1.39	900C_3hr	1,513.650024	TE	7.9	52.299999	59.990002	15.64	2.485	0.586	42.369999	66.419998	0.496	1.605	0.852	BATCH_25	Synthetic	cut-back	0.088
1.834	342.299988	Air	4.02	LPCVD	Wet Etch	3.34	900C_3hr	1,515.079956	TM	9.84	45.740002	195.009995	15.71	3.483	1.88	47.32	58.93	0.209	1.639	0.895	BATCH_48	Synthetic	microring_Q	0.137
0.608	571.159973	SiO2	2.51	Sputtering	ICP	1.77	900C_1hr	1,549.939941	TM	-6.15	61.529999	163.649994	25.379999	7.474	2.407	44.139999	76.07	0.073	1.658	0.765	BATCH_41	Synthetic	microring_Q	0.163
1.178	345.839996	Air	4.68	Sputtering	ICP	3.05	900C_1hr	1,557.26001	TM	4.31	31.030001	181.289993	22.950001	3.502	1.258	63.240002	86.050003	0.294	1.576	0.755	BATCH_22	Synthetic	OTDR	0.093
1.314	225.729996	SiO2	4.91	PECVD	ICP	0.7	1000C_1hr	1,571	TM	-7.54	65.360001	47.439999	45.540001	18.195999	3.808	40.709999	85.519997	0.363	1.963	0.804	BATCH_35	Measurement	ring_resonance	0.131
0.899	272.850006	SiO2	3.44	LPCVD	ICP	2.34	900C_1hr	1,506.530029	TE	2.15	69.040001	160.830002	24.450001	13.296	4.98	52.490002	54.900002	0.235	1.621	0.734	BATCH_26	Measurement	ring_resonance	0.177
1.935	418.399994	SiO2	1.59	Sputtering	Wet Etch	0.55	900C_1hr	1,513.630005	TE	5.77	56.759998	90.769997	25.68	10.052	3.517	57.41	43.110001	0.051	1.524	0.736	BATCH_22	Synthetic	OTDR	0.196
1.715	400.390015	Polymer	2.8	Sputtering	RIE	2.78	No_Anneal	1,594.060059	TM	3.67	43.169998	49.849998	43.720001	14.789	2.998	81	70.980003	0.323	1.53	0.874	BATCH_1	Synthetic	cut-back	0.112
1.054	520.169983	Polymer	3.7	Sputtering	Wet Etch	1.39	900C_1hr	1,585.560059	TM	6.27	77.029999	74.720001	47.360001	8.861	1.763	85.389999	80.629997	0.419	1.582	0.855	BATCH_26	Synthetic	ring_resonance	0.198
1.174	465.410004	Air	4.09	LPCVD	ICP	3.22	900C_3hr	1,524.540039	TM	-3.04	20.690001	62.740002	44.139999	2.354	0.383	42.490002	48.880001	0.472	1.629	0.835	BATCH_23	Measurement	cut-back	0.13
1.611	215.020004	SiO2	1.68	Sputtering	ICP	3.63	900C_3hr	1,546.829956	TM	5.85	27.790001	50.400002	36.189999	15.913	3.932	87.370003	54.27	0.315	1.893	0.948	BATCH_12	Synthetic	ring_resonance	0.092
0.955	511.829987	Air	2.06	LPCVD	RIE	1.34	900C_1hr	1,530.640015	TE	-8.65	68.940002	178.580002	10.6	4.392	2.854	67.940002	51.200001	0.222	1.958	0.925	BATCH_50	Synthetic	ring_resonance	0.03
0.816	298.220001	Polymer	1.81	LPCVD	Wet Etch	2.68	900C_3hr	1,500.390015	TE	4.9	36.330002	145.039993	27.51	11.3	3.894	79.93	46.98	0.42	1.73	0.808	BATCH_50	Measurement	OTDR	0.14
0.694	240.960007	Polymer	4.42	Sputtering	Wet Etch	4.89	1000C_1hr	1,557.939941	TE	-6.53	65.150002	39.630001	47.599998	15.782	2.918	76.629997	84.75	0.467	1.771	0.774	BATCH_22	Measurement	OTDR	0.112
1.935	472.160004	Polymer	3.78	LPCVD	ICP	4.36	900C_3hr	1,583.709961	TE	-2.69	34.23	70.260002	39.84	14.907	3.287	69.349998	61.849998	0.223	1.686	0.802	BATCH_20	Synthetic	ring_resonance	0.096
1.545	328.76001	Air	2.8	Sputtering	Wet Etch	3.96	900C_1hr	1,504.959961	TM	7.85	38.91	125.639999	13.78	7.336	4.84	83.949997	84.720001	0.249	1.734	0.777	BATCH_3	Measurement	cut-back	0.035
1.481	391.660004	SiO2	2.1	Sputtering	RIE	0.92	No_Anneal	1,522.72998	TE	9.5	46.630001	43.080002	43.470001	21.08	4.53	75.209999	63.060001	0.117	1.588	0.754	BATCH_18	Synthetic	OTDR	0.036
1.248	524.73999	Polymer	2.63	Sputtering	Wet Etch	1.32	900C_1hr	1,546.630005	TM	1.28	44.290001	48.98	46.759998	18.523001	3.609	85.910004	44.860001	0.356	1.811	0.861	BATCH_36	Measurement	OTDR	0.035
0.885	335.019989	SiO2	4.88	Sputtering	RIE	2.89	No_Anneal	1,552.449951	TE	-8.15	50.869999	41.82	11.72	4.306	2.635	61.830002	71.330002	0.295	1.959	0.763	BATCH_48	Measurement	microring_Q	0.137
1.153	448.309998	SiO2	3.44	PECVD	RIE	4.01	900C_1hr	1,509.380005	TM	2.21	75.93	136.229996	14.76	2.588	0.461	74.230003	47.02	0.433	1.845	0.778	BATCH_7	Synthetic	microring_Q	0.033
1.477	568.700012	Polymer	4.46	LPCVD	RIE	3.65	900C_3hr	1,505.689941	TM	0.67	75.559998	118.050003	28.49	4.166	1.139	88.379997	87.660004	0.206	1.913	0.836	BATCH_9	Measurement	ring_resonance	0.121
1.966	425.089996	Polymer	3.37	PECVD	ICP	0.83	900C_3hr	1,536.849976	TM	-1.09	63.470001	62.43	48.439999	20.490999	3.819	85.57	65.639999	0.128	1.566	0.765	BATCH_50	Synthetic	cut-back	0.177
0.536	589.650024	Polymer	3.29	LPCVD	ICP	4.85	No_Anneal	1,556.660034	TM	9.95	75.330002	132.740005	9.09	5.379	4.609	41.490002	72.120003	0.27	1.658	0.808	BATCH_48	Measurement	OTDR	0.049
1.351	470.720001	Air	4.07	PECVD	ICP	4.49	No_Anneal	1,512.469971	TE	3.45	61.200001	78.279999	18.540001	7.771	3.478	63.700001	82.029999	0.446	1.517	0.705	BATCH_15	Measurement	cut-back	0.155
1.107	489.019989	Polymer	1.78	PECVD	Wet Etch	1.28	900C_1hr	1,522.880005	TM	-8.49	62.389999	113.910004	16.370001	8.364	4.139	77.589996	77.129997	0.044	1.874	0.883	BATCH_12	Measurement	microring_Q	0.089
1.409	445.079987	Air	2.22	LPCVD	Wet Etch	1.71	No_Anneal	1,525.420044	TM	5.25	29.9	174.880005	30.32	15.196	4.651	61.950001	56.98	0.257	1.864	0.733	BATCH_4	Synthetic	microring_Q	0.116
0.693	229.869995	SiO2	4.15	LPCVD	ICP	4.02	900C_3hr	1,592.02002	TM	-7.47	56.59	93.459999	36.91	10.47	2.666	66.779999	87.120003	0.066	1.691	0.88	BATCH_17	Synthetic	cut-back	0.173
0.619	327.160004	Polymer	1.53	Sputtering	Wet Etch	1.42	1000C_1hr	1,505.199951	TM	-4.67	58.93	147.729996	40.860001	7.71	1.539	65.75	73.400002	0.111	1.922	0.811	BATCH_38	Measurement	OTDR	0.132
0.762	468.390015	Air	4.87	LPCVD	RIE	1.38	No_Anneal	1,573.099976	TE	-7.65	49.889999	104.110001	39.66	4.95	1.092	46.619999	53.639999	0.214	1.92	0.866	BATCH_30	Synthetic	OTDR	0.12
0.672	201.160004	Air	2.59	LPCVD	ICP	4.72	900C_3hr	1,506.97998	TM	0.51	34.91	140.070007	44.900002	11.594	2.253	52.299999	60.209999	0.026	1.801	0.833	BATCH_8	Synthetic	ring_resonance	0.04
1.109	594.460022	Air	2.92	Sputtering	RIE	4.71	1000C_1hr	1,555.02002	TE	-1.93	66.449997	22.629999	45.580002	19.509001	4.095	82.279999	40.389999	0.419	1.745	0.756	BATCH_44	Measurement	cut-back	0.112
1.621	489.709991	SiO2	1.94	Sputtering	RIE	1.4	900C_1hr	1,542.98999	TM	-6.36	75.389999	170.229996	6.23	1.811	0.925	82.199997	49.139999	0.188	1.571	0.929	BATCH_25	Synthetic	ring_resonance	0.084
1.724	455.709991	Air	4.98	Sputtering	ICP	3.01	1000C_1hr	1,507.359985	TE	-4.71	26.66	117.300003	24.059999	2.848	0.53	55.82	51.950001	0.09	1.792	0.78	BATCH_44	Synthetic	microring_Q	0.096
1.535	216.059998	Polymer	2	PECVD	RIE	4.05	900C_1hr	1,534.859985	TM	0.11	35.130001	180.779999	14.12	7.017	4.232	68.150002	58.810001	0.199	1.856	0.763	BATCH_26	Measurement	OTDR	0.137
1.467	520.73999	Polymer	1.88	Sputtering	Wet Etch	3.93	No_Anneal	1,514.5	TM	-2.76	56.75	71.029999	44.34	22.339001	4.849	70.830002	63.889999	0.362	1.841	0.818	BATCH_20	Measurement	ring_resonance	0.029
1.579	437.01001	SiO2	2.45	PECVD	RIE	1.46	900C_1hr	1,538.800049	TE	1.22	78.760002	190.529999	49.509998	6.901	1.161	67.540001	81.129997	0.302	1.64	0.845	BATCH_37	Synthetic	ring_resonance	0.013
1.271	466.029999	Air	3.83	Sputtering	RIE	2.06	900C_3hr	1,537.290039	TE	-9.92	68.540001	53.740002	21.940001	5.923	2.335	60.619999	87.129997	0.492	1.971	0.859	BATCH_36	Measurement	ring_resonance	0.119
0.676	414.519989	Polymer	1.77	LPCVD	Wet Etch	1.38	1000C_1hr	1,597.180054	TE	0.38	35.099998	110.239998	47.860001	8.305	1.468	64.839996	58.200001	0.399	1.506	0.769	BATCH_48	Measurement	OTDR	0.051
1.514	253.210007	Air	3.23	PECVD	RIE	2.18	No_Anneal	1,526.140015	TM	0.89	78.18	27.27	15.08	7.92	4.711	70.940002	56.34	0.422	1.73	0.761	BATCH_10	Measurement	cut-back	0.074
0.556	548.309998	Polymer	2.62	LPCVD	ICP	0.94	900C_3hr	1,533.22998	TE	-5.96	25.440001	162.960007	8.21	1.56	0.23	83.550003	78.75	0.224	1.576	0.87	BATCH_49	Synthetic	cut-back	0.121
1.528	323.339996	Air	3.16	PECVD	Wet Etch	2.18	900C_3hr	1,584.390015	TE	-9.35	73.150002	173.380005	32.869999	10.313	2.623	51.27	63.919998	0.286	1.667	0.908	BATCH_13	Synthetic	microring_Q	0.061
1.708	546.830017	SiO2	2.52	PECVD	ICP	0.92	No_Anneal	1,540.77002	TM	7.6	46.290001	38.619999	44.720001	5.028	0.873	60.32	76.129997	0.034	1.874	0.85	BATCH_50	Measurement	OTDR	0.103
1.097	242.899994	Air	3.55	PECVD	RIE	4.33	900C_3hr	1,515.150024	TM	-6.91	31.370001	198.990005	41.84	11.521	2.472	51.84	52.639999	0.477	1.594	0.807	BATCH_45	Measurement	cut-back	0.032
0.882	589.659973	Polymer	3.79	PECVD	ICP	3.82	1000C_1hr	1,573.040039	TE	-6.67	30.059999	36.130001	26.799999	11.071	3.913	45.490002	72.300003	0.442	1.952	0.892	BATCH_15	Synthetic	microring_Q	0.061
0.776	404.029999	Polymer	4.5	PECVD	Wet Etch	1.43	900C_1hr	1,558.939941	TE	2.43	36.290001	34.220001	9.55	3.277	2	64.720001	80.580002	0.095	1.589	0.929	BATCH_25	Synthetic	ring_resonance	0.087
1.23	574.210022	Polymer	1.46	PECVD	Wet Etch	1.15	No_Anneal	1,549.75	TM	-5.53	27.280001	172.690002	11.22	6.083	4.393	80.879997	87.440002	0.137	1.831	0.706	BATCH_5	Measurement	cut-back	0.038
0.608	300.48999	Polymer	3.93	LPCVD	RIE	3.22	No_Anneal	1,559.77002	TM	7.2	71.18	199.779999	5.93	2.672	2.284	59.369999	80.269997	0.417	1.526	0.814	BATCH_23	Measurement	microring_Q	0.105
1.348	506.119995	Air	4.46	LPCVD	RIE	2.83	900C_3hr	1,596.959961	TE	5.29	41.75	61.049999	23.889999	12.602	4.542	73.550003	83.879997	0.208	1.914	0.728	BATCH_33	Synthetic	microring_Q	0.019
0.526	279.269989	Air	3.95	Sputtering	ICP	3.38	900C_1hr	1,580.709961	TM	-9.87	63.279999	197.830002	21.559999	12.501	4.906	73.949997	71.480003	0.461	1.73	0.891	BATCH_7	Measurement	OTDR	0.115
0.592	575.659973	Polymer	2.38	Sputtering	Wet Etch	2.62	900C_3hr	1,524.47998	TM	0.06	48.509998	80.419998	40.619999	19.26	4.418	59.82	78.5	0.481	1.56	0.718	BATCH_30	Measurement	cut-back	0.111
1.863	278.48999	SiO2	2.04	PECVD	ICP	4.68	900C_1hr	1,550.76001	TM	-8.82	27.51	34.380001	11.98	6.283	4.181	41.669998	53.369999	0.083	1.909	0.781	BATCH_50	Synthetic	microring_Q	0.123
1.909	373.570007	Polymer	2.91	PECVD	ICP	3.67	No_Anneal	1,500.890015	TE	-6.12	52.25	157.039993	19.08	7.074	2.845	48.060001	44.419998	0.203	1.733	0.726	BATCH_29	Measurement	OTDR	0.173
1.93	536.820007	Air	2.28	PECVD	Wet Etch	1.19	No_Anneal	1,513.300049	TE	4.7	46.669998	119.230003	44.16	14.107	2.932	77.68	87.07	0.261	1.886	0.892	BATCH_14	Synthetic	cut-back	0.16
1.911	475.540009	Polymer	1.9	PECVD	Wet Etch	1.19	900C_3hr	1,559.189941	TM	5.67	59.389999	136.309998	43.330002	3.511	0.561	54.279999	45.810001	0.411	1.526	0.831	BATCH_21	Measurement	microring_Q	0.111
0.508	424.839996	Polymer	2.9	LPCVD	ICP	0.51	900C_1hr	1,592.439941	TM	9.58	40.18	171.190002	41.919998	4.22	0.537	59.98	82.540001	0.338	1.506	0.781	BATCH_26	Synthetic	ring_resonance	0.053
1.138	237.800003	SiO2	2.65	Sputtering	Wet Etch	4.07	No_Anneal	1,569.050049	TM	-8.57	58.259998	106.18	18.9	5.035	1.771	80.260002	67.150002	0.122	1.934	0.84	BATCH_5	Synthetic	ring_resonance	0.114
1.477	334.470001	SiO2	1.79	PECVD	Wet Etch	1.48	900C_3hr	1,572.22998	TE	3.94	74.25	166.910004	29.73	8.894	2.359	46.57	77.379997	0.214	1.65	0.731	BATCH_11	Synthetic	microring_Q	0.032
1.614	328.309998	Polymer	1.8	Sputtering	RIE	2.89	900C_3hr	1,537.689941	TE	3.59	20.950001	165.899994	16.950001	1.702	0.172	86.610001	46.939999	0.296	1.548	0.943	BATCH_50	Measurement	ring_resonance	0.144
1.178	322.809998	SiO2	2.46	Sputtering	RIE	1.47	1000C_1hr	1,555.420044	TM	9.19	66.239998	176.940002	3.13	2.287	1.982	78.339996	61.84	0.472	1.932	0.757	BATCH_47	Synthetic	cut-back	0.092
1.739	329.01001	Polymer	1.31	LPCVD	ICP	2.03	1000C_1hr	1,518.140015	TE	6.69	38	71.629997	38.040001	3.122	0.309	61	40.93	0.473	1.581	0.838	BATCH_27	Synthetic	microring_Q	0.014
1.29	384.640015	Polymer	4.89	PECVD	Wet Etch	4.91	900C_1hr	1,537.780029	TE	-5.38	21.01	59.029999	35.869999	8.892	2.078	61.139999	80.089996	0.358	1.714	0.795	BATCH_19	Measurement	cut-back	0.169
1.522	370.410004	Polymer	4.1	PECVD	ICP	2.27	900C_1hr	1,514.680054	TM	-3.4	79.690002	164.220001	21.209999	10.421	4.559	59.099998	86.900002	0.489	1.858	0.795	BATCH_41	Synthetic	microring_Q	0.175
1.703	240.880005	Air	3.07	LPCVD	ICP	1.83	900C_3hr	1,575.349976	TM	4.12	41.130001	136.419998	24.709999	11.079	3.989	55.139999	69.489998	0.051	1.816	0.723	BATCH_5	Measurement	microring_Q	0.103
0.896	268.630005	SiO2	3.39	PECVD	ICP	3.85	1000C_1hr	1,595.469971	TM	-5.53	44.68	147.570007	8.61	2.969	2.224	40.209999	68.849998	0.165	1.663	0.702	BATCH_38	Measurement	ring_resonance	0.133
1.426	270.850006	Air	1.08	LPCVD	ICP	2.96	No_Anneal	1,586.819946	TM	-6.05	71.629997	126.68	29.540001	11.331	3.492	65.839996	79.5	0.399	1.735	0.932	BATCH_18	Measurement	microring_Q	0.094
0.659	402.549988	SiO2	4.6	PECVD	ICP	1.25	900C_1hr	1,581.459961	TM	-6.29	66.089996	71.589996	44.599998	22.099001	4.628	89.82	78.989998	0.07	1.952	0.841	BATCH_33	Measurement	cut-back	0.106
1.353	250.470001	Air	1.38	Sputtering	ICP	1.4	1000C_1hr	1,582.26001	TM	-2.04	74.879997	184.529999	14.41	4.071	1.527	57.139999	44.630001	0.011	1.711	0.836	BATCH_50	Measurement	microring_Q	0.081
1.295	279.630005	Air	4.14	PECVD	Wet Etch	4.71	1000C_1hr	1,540.280029	TM	-6.56	67.110001	20.139999	40.509998	8.225	1.684	41.82	65.410004	0.273	1.534	0.82	BATCH_25	Measurement	cut-back	0.139
0.587	510.649994	Air	3.41	LPCVD	RIE	4.12	No_Anneal	1,502.530029	TM	-1.94	67.639999	58.599998	9.1	4.265	2.664	52.639999	43.200001	0.319	1.691	0.733	BATCH_39	Measurement	cut-back	0.1
1.552	595.159973	Polymer	4.07	Sputtering	ICP	1.08	900C_1hr	1,525.790039	TE	-2.69	24.889999	24.969999	19.620001	3.979	1.538	50.91	69.879997	0.1	1.615	0.802	BATCH_29	Synthetic	microring_Q	0.125
1.643	565.440002	Air	2.44	PECVD	ICP	2.34	900C_1hr	1,575.390015	TM	9.34	78.5	157.009995	1.6	1.185	3.263	43.34	51.459999	0.482	1.526	0.894	BATCH_49	Synthetic	OTDR	0.102
0.976	396.279999	Polymer	2.54	Sputtering	ICP	3.14	No_Anneal	1,502.359985	TM	-8.77	56.610001	180.229996	33.349998	11.152	2.965	46.689999	47.099998	0.44	1.675	0.872	BATCH_32	Synthetic	ring_resonance	0.193
1.297	331.540009	SiO2	2.23	PECVD	Wet Etch	2.24	900C_3hr	1,551.01001	TE	-5.66	21.25	134.380005	11.81	7.03	4.517	63.549999	66.919998	0.019	1.533	0.723	BATCH_16	Measurement	OTDR	0.15
1.747	261	Polymer	4.18	Sputtering	Wet Etch	3.29	No_Anneal	1,500.689941	TE	-0.5	24.99	110.669998	20.879999	8.535	3.478	45.93	56.950001	0.455	1.975	0.706	BATCH_18	Synthetic	microring_Q	0.042
1.802	560.780029	Polymer	2.85	Sputtering	RIE	3.94	No_Anneal	1,562.930054	TM	-6.08	63.09	147.070007	11.85	3.679	2.645	64.110001	56.689999	0.252	1.953	0.899	BATCH_36	Measurement	ring_resonance	0.109

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